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利用阴极电弧等离子体蒸发在钛上制备用于生物医学应用的氮化钛薄膜。

Fabrication of Titanium Nitride Thin Film on Titanium Using Cathodic Arc Plasma Evaporation for Biomedical Application.

作者信息

Trinh Trung Van, Le Hung Thai, Thi Bang Le

机构信息

School of Materials Science and Engineering, Hanoi University of Science and Technology, No.1 Dai Co Viet, Hanoi, Vietnam.

出版信息

Eur J Dent. 2025 Jul 23. doi: 10.1055/s-0045-1810016.

Abstract

Commercially pure titanium (Cp-Ti) is often used for biomedical implant devices but has low hardness and wear resistance; therefore, it is not suitable for use in the sliding parts or joints. Owing to their good wear resistance and biocompatibility, titanium nitride (TiN) coatings are used to improve these surface properties of Ti. This study aims to fabricate TiN on Cp-Ti by cathodic arc plasma evaporation and to investigate the effect of Cp-Ti substrate temperature on the properties of coated TiN thin films for biomedical applications.Coated TiN thin films were deposited on Cp-Ti at different substrate temperatures of 25, 100, 175, and 250°C. The surface morphology, roughness, phase composition, hardness, coating adhesion, and biocompatibility of the TiN coatings were investigated using a digital optical microscope, scanning electron microscope, X-ray diffractometer, hardness tester, and cell studies.Statistical differences were evaluated using analysis of variance (ANOVA) and Tukey's multiple comparison analysis, with statistical significance set at  < 0.05.Thin films with a primary TiN phase were formed on the surface of the Cp-Ti substrate regardless of substrate temperatures. There was no significant difference in surface hardness between the coated samples even though the sample coated at 100 and 175°C showed a slightly higher values, ranging from 193 to 199 HV. Interestingly, surface roughness and coating adhesion were significantly influenced by substrate temperature. The higher the substrate temperature, the greater the surface roughness, while the best adhesion, with the hardness of 176 HV, was obtained at substrate temperature of 25°C. cell study indicated that the baby hamster kidney cells on the coating surface have grown and proliferated better than those on the uncoated surface.The TiN thin film was successfully coated on Ti by cathodic arc plasma evaporation at different substrate temperatures, ranging from 25 to 250°C. The adhesion of the coating at low substrate temperature (25°C) was the best compared to other substrate temperatures of 100, 175, and 250°C. cell studies have demonstrated the biocompatibility of the coated TiN thin film.

摘要

商业纯钛(Cp-Ti)常用于生物医学植入装置,但硬度和耐磨性较低;因此,它不适用于滑动部件或关节。由于其良好的耐磨性和生物相容性,氮化钛(TiN)涂层被用于改善钛的这些表面性能。本研究旨在通过阴极电弧等离子体蒸发在Cp-Ti上制备TiN,并研究Cp-Ti基体温度对用于生物医学应用的涂层TiN薄膜性能的影响。

在25、100、175和250°C的不同基体温度下,将TiN涂层薄膜沉积在Cp-Ti上。使用数字光学显微镜、扫描电子显微镜、X射线衍射仪、硬度测试仪和细胞研究来研究TiN涂层的表面形貌、粗糙度、相组成、硬度、涂层附着力和生物相容性。

使用方差分析(ANOVA)以及Tukey多重比较分析来评估统计差异,设定统计学显著性为<0.05。

无论基体温度如何,在Cp-Ti基体表面均形成了以TiN为主相的薄膜。尽管在100和175°C下涂层的样品表面硬度略高,范围为193至199 HV,但涂层样品之间的表面硬度没有显著差异。有趣的是,表面粗糙度和涂层附着力受基体温度的显著影响。基体温度越高,表面粗糙度越大,而在25°C的基体温度下获得了最佳附着力,硬度为176 HV。细胞研究表明,涂层表面的幼仓鼠肾细胞比未涂层表面的细胞生长和增殖得更好。

通过阴极电弧等离子体蒸发在25至250°C的不同基体温度下成功地在钛上涂覆了TiN薄膜。与100、175和250°C的其他基体温度相比,在低基体温度(25°C)下涂层的附着力最佳。细胞研究证明了涂层TiN薄膜的生物相容性。

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