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Ti65合金中与温度相关的变形机制:原位拉伸研究

Temperature-Dependent Deformation Mechanisms in Ti65 Alloy: An In Situ Tensile Study.

作者信息

Li Haitao, Li Chenxu, Chen Dongmei, Liu Yujing, Zhao Zibo, Zhang Bohua, Qi Meng, Liu Jianrong, Wang Qingjiang

机构信息

Shenyang Aircraft Design and Research Institute, Aviation Industry Corporation of China, Shenyang 110035, China.

Yuhua Institute of Advanced Materials, Baoji Xigong Titanium Alloy Products Co., Ltd., Baoji 721300, China.

出版信息

Materials (Basel). 2025 Jul 11;18(14):3270. doi: 10.3390/ma18143270.

Abstract

Understanding the relationship between deformation behavior and mechanisms at elevated temperatures is of great significance for applications of high-temperature titanium alloys. This study systematically investigates the plastic deformation behavior of Ti65 alloy under both room-temperature and high-temperature conditions through in situ tensile testing, combined with slip trace analysis, crystal orientation analysis, and geometrical compatibility factor evaluation. TEM observations and molecular dynamics simulations reveal that plastic deformation is predominantly accommodated by basal and prismatic slip systems with minimal pyramidal slip contribution at room temperature. However, elevated temperatures significantly promote pyramidal and <c+a> slip due to thermal activation. This transition stems from a shift in deformation mechanisms: while room-temperature deformation relies on multi-slip and grain rotation to accommodate strain, high-temperature deformation is governed by efficient slip transfer across grain boundaries enabled by enhanced geometrical compatibility. Consistent with this, thermal activation at elevated temperatures reduces the critical resolved shear stress (CRSS), preferentially activating 1/3<11-23> dislocations and thereby substantially improving plastic deformation capability. These findings provide critical insights into the temperature-dependent deformation mechanisms of Ti65 alloy, offering valuable guidance for performance optimization in high-temperature applications.

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