在填充因子 ν = 7/11 时朗道平带中的拓扑保护，这是非常规关联的一个候选填充因子。
Topological protection in a Landau flat band at = 7/11, a candidate filling factor for unconventional correlations.
作者信息
Hussain Waseem, Huang Haoyun, Pfeiffer Loren N, West Kenneth W, Baldwin Kirk W, Csáthy Gábor A
机构信息
Department of Physics and Astronomy, Purdue University, West Lafayette, IN 47907, USA.
Department of Electrical Engineering, Princeton University, Princeton, NJ 08544, USA.
出版信息
PNAS Nexus. 2025 Aug 6;4(8):pgaf254. doi: 10.1093/pnasnexus/pgaf254. eCollection 2025 Aug.
Strong interactions in Landau flat bands are known to stabilize correlated states that do not form in other types of flat bands. We report hallmarks of topological protection at the Landau level filling factor in a 2D electron system. The filling factor is the particle-hole conjugate of , a filling factor intensely studied for the possibility of realizing unconventional electronic correlations. Our data establish a new instance for an unusual fractional quantum Hall state and opens up possibilities for the study of unconventional correlations in an enlarged parameter space. We report and discuss transport signatures developing at other filling factors of interest , and , which however in our sample do not exhibit topological protection.
已知朗道平带中的强相互作用会稳定在其他类型平带中不形成的关联态。我们报道了二维电子系统中朗道能级填充因子处拓扑保护的特征。填充因子是 的粒子 - 空穴共轭， 是一个因有可能实现非常规电子关联而被深入研究的填充因子。我们的数据为一种不寻常的分数量子霍尔态建立了一个新实例，并为在扩大的参数空间中研究非常规关联开辟了可能性。我们报道并讨论了在其他感兴趣的填充因子 、 和 处出现的输运特征，然而在我们的样本中，这些填充因子并未表现出拓扑保护。
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