Li Chun-Lin, Feng Guo-Hua
Department of Power Mechanical Engineering, National Tsing Hua University, Hsinchu 30013, Taiwan.
Institute of Nano Engineering and MicroSystems, National Tsing Hua University, Hsinchu 30013, Taiwan.
Micromachines (Basel). 2025 Jul 29;16(8):879. doi: 10.3390/mi16080879.
This work presents an innovative hydrothermal approach for fabricating flexible piezoelectric PZT thin films on 20 μm titanium foil substrates using TiO and SrTiO (STO) interlayers. Three heterostructures (Ti/PZT, Ti/TiO/PZT, and Ti/TiO/STO/PZT) were synthesized to enable low-temperature growth and improve ferroelectric performance for advanced flexible MEMS. Characterizations including XRD, PFM, and P-E loop analysis evaluated crystallinity, piezoelectric coefficient d, and polarization behavior. The results demonstrate that the multilayered Ti/TiO/STO/PZT structure significantly enhances performance. XRD confirmed the STO buffer layer effectively reduces lattice mismatch with PZT to ~0.76%, promoting stable morphotropic phase boundary (MPB) composition formation. This optimized film exhibited superior piezoelectric and ferroelectric properties, with a high d of 113.42 pm/V, representing an ~8.65% increase over unbuffered Ti/PZT samples, and displayed more uniform domain behavior in PFM imaging. Impedance spectroscopy showed the lowest minimum impedance of 8.96 Ω at 10.19 MHz, indicating strong electromechanical coupling. Furthermore, I-V measurements demonstrated significantly suppressed leakage currents in the STO-buffered samples, with current levels ranging from 10 A to 10 A over ±3 V. This structure also showed excellent fatigue endurance through one million electrical cycles, confirming its mechanical and electrical stability. These findings highlight the potential of this hydrothermally engineered flexible heterostructure for high-performance actuators and sensors in advanced MEMS applications.
这项工作提出了一种创新的水热方法,用于在20μm钛箔基板上使用TiO和SrTiO(STO)中间层制备柔性压电PZT薄膜。合成了三种异质结构(Ti/PZT、Ti/TiO/PZT和Ti/TiO/STO/PZT),以实现低温生长并改善先进柔性微机电系统的铁电性能。包括XRD、PFM和P-E回线分析在内的表征评估了结晶度、压电系数d和极化行为。结果表明,多层Ti/TiO/STO/PZT结构显著提高了性能。XRD证实,STO缓冲层有效地将与PZT的晶格失配降低至约0.76%,促进了稳定的准同型相界(MPB)组成的形成。这种优化后的薄膜表现出优异的压电和铁电性能,d值高达113.42 pm/V,比未缓冲的Ti/PZT样品提高了约8.65%,并且在PFM成像中显示出更均匀的畴行为。阻抗谱显示在10.19 MHz时最低最小阻抗为8.96Ω,表明存在强机电耦合。此外,I-V测量表明,STO缓冲样品中的漏电流得到了显著抑制,在±3 V范围内电流水平为10 A至10 A。这种结构在经过一百万次电循环后还表现出优异的疲劳耐久性,证实了其机械和电气稳定性。这些发现突出了这种水热工程柔性异质结构在先进微机电系统应用中用于高性能致动器和传感器的潜力。