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关于外部电场诱导的4N-双空位缺陷石墨烯量子点弯曲及金属离子掺杂效应的密度泛函理论研究

A DFT study on the curving of 4N-divacancy defected graphene quantum dots induced by an external electric field and the effects of metal-ion doping.

作者信息

Kuamit Thanawit, Santiwarodom Wilasinee, Apilardmongkol Pavee, Kongkaew Sirilak, Parasuk Vudhichai

机构信息

Center of Excellence in Computational Chemistry (CECC), Department of Chemistry, Faculty of Science, Chulalongkorn University, Pathumwan, Bangkok 10330, Thailand.

出版信息

Phys Chem Chem Phys. 2025 Sep 2. doi: 10.1039/d5cp02152a.

Abstract

We conducted a study to examine the impact of an external electric field on the curvature of metal and divalent metal ion doped 4N divacancy-defected graphene quantum dots (4N-GQDs), utilizing Density Functional Theory (DFT). We considered six common metal species, namely Ca, Ca, Cr, Cr, Fe, and Fe. Our findings reveal that the curvature of metal and divalent metal ion-doped-4N-GQDs increases as the external electric field strength rises in both positive and negative directions. However, the direction of curvature is contingent upon the orientation of the electric field, which is perpendicular to the 4N-GQD plane. The curvature directions of metal and divalent metal ion-doped-4N-GQDs under positive and negative electric fields are opposite. It is interesting to note that the HOMO-LUMO gap of metal and divalent metal ion doped 4N-GQDs can be altered by applying an external electric field exceeding ±0.020 a.u. Within this context, the gap for 4N-GQDs doped with these ions typically spans from 1.64 to 2.98 eV, which is lower than that of GQDs and undoped 4N-GQDs. As a result, we advocate a technique to deliberately induce curvature for metal and divalent metal ion-doped 4N-GQDs, thereby altering their electronic properties through the application of an external electric field. These materials show substantial promise as anchoring materials for electronic devices.

摘要

我们利用密度泛函理论(DFT)进行了一项研究,以检验外部电场对金属和二价金属离子掺杂的4N双空位缺陷石墨烯量子点(4N-GQDs)曲率的影响。我们考虑了六种常见的金属物种,即Ca、Ca、Cr、Cr、Fe和Fe。我们的研究结果表明,在正负两个方向上,随着外部电场强度的增加,金属和二价金属离子掺杂的4N-GQDs的曲率都会增大。然而,曲率方向取决于电场的方向,电场方向垂直于4N-GQD平面。在正电场和负电场下,金属和二价金属离子掺杂的4N-GQDs的曲率方向相反。值得注意的是,通过施加超过±0.020 a.u.的外部电场,可以改变金属和二价金属离子掺杂的4N-GQDs的HOMO-LUMO能隙。在此背景下,掺杂这些离子的4N-GQDs的能隙通常在1.64至2.98 eV之间,低于GQDs和未掺杂的4N-GQDs。因此,我们提倡一种技术,通过施加外部电场来故意诱导金属和二价金属离子掺杂的4N-GQDs的曲率,从而改变它们的电子性质。这些材料作为电子器件的锚定材料具有很大的潜力。

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