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氯掺杂石墨相氮化碳用于增强活性黑5的光催化降解:水修复的机理及密度泛函理论见解

Chlorine-Doped Graphitic Carbon Nitride for Enhanced Photocatalytic Degradation of Reactive Black 5: Mechanistic and DFT Insights into Water Remediation.

作者信息

Ji Jau-Min, Geleta Tesfaye Abebe, Shih Yang-Hsin, Tee Ren Qian

机构信息

Department of Agricultural Chemistry, National Taiwan University, No. 1, Sec. 4, Roosevelt Road, Taipei 106, Taiwan.

出版信息

ACS Omega. 2025 Aug 27;10(35):39861-39874. doi: 10.1021/acsomega.5c04017. eCollection 2025 Sep 9.

Abstract

Photocatalysts are recognized as eco-friendly technologies that exhibit significant potential for removing organic pollutants upon exposure to light. Herein, we successfully modified graphitic carbon nitride (CNM) by chlorine (Cl) doping through a calcination process to enhance the photocatalytic degradation of Reactive Black 5 (RB5) under visible-light irradiation. The Cl-doping efficiency was comprehensively assessed, with CNM-Cl(0.4) demonstrating the best photocatalytic performance, achieving a rate constant of 0.199 min , which is 1.76 times higher than that of undoped CNM. The observed enhancement can be ascribed to the improved photocurrent response and the narrowing of the bandgap, both of which result from the incorporation of chlorine into the CNM framework. The incorporation of Cl into CNM resulted in more than double the photocurrent generation compared to bare CNM, promoting rapid charge carrier separation and significantly reducing charge recombination. This was further supported by BET surface area analysis, where Cl doping led to a ∼4-fold increase in specific surface area, facilitating more active sites for pollutant adsorption. Additional information about the electronic characteristics of CNM and CNM-Cl was obtained through first-principles density functional theory (DFT) calculations, which confirmed the experimental findings. The photocatalytic degradation mechanism is carried out by the production of reactive oxygen species, such as hydroxyl radicals (•OH) and superoxide anions (•O ). The results of this study show that chlorine doping greatly improves the photocatalytic performance of carbon nitride materials (CNM). This modification makes CNM a very promising metal-free photocatalyst for environmental remediation and water purification under visible light irradiation, especially considering its high stability, reusability, and eco-friendly synthetic approach.

摘要

光催化剂被认为是一种环保技术,在光照下具有去除有机污染物的巨大潜力。在此,我们通过煅烧过程成功地用氯(Cl)掺杂修饰了石墨相氮化碳(CNM),以增强活性黑5(RB5)在可见光照射下的光催化降解性能。全面评估了Cl掺杂效率,其中CNM-Cl(0.4)表现出最佳的光催化性能,速率常数达到0.199 min⁻¹,比未掺杂的CNM高1.76倍。观察到的性能增强可归因于光电流响应的改善和带隙的变窄,这两者都是由于氯掺入CNM骨架所致。与未掺杂的CNM相比,Cl掺入CNM导致光电流产生增加了一倍多,促进了快速的电荷载流子分离并显著减少了电荷复合。BET表面积分析进一步支持了这一点,其中Cl掺杂导致比表面积增加了约4倍,为污染物吸附提供了更多活性位点。通过第一性原理密度泛函理论(DFT)计算获得了关于CNM和CNM-Cl电子特性的更多信息,证实了实验结果。光催化降解机理是通过产生活性氧物种,如羟基自由基(•OH)和超氧阴离子(•O₂⁻)来进行的。本研究结果表明,氯掺杂极大地提高了氮化碳材料(CNM)的光催化性能。这种改性使CNM成为一种非常有前途的无金属光催化剂,用于可见光照射下的环境修复和水净化,特别是考虑到其高稳定性、可重复使用性和环保的合成方法。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/4294/12423792/440734678e0b/ao5c04017_0001.jpg

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