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A resistance monitor with power cut-off for automatic regulation of shadow and support film thickness in freeze-etching and related techniques.

作者信息

Steere R L, Erbe E F, Moseley J M

出版信息

J Microsc. 1977 Dec;111(3):313-28. doi: 10.1111/j.1365-2818.1977.tb00071.x.

Abstract

A resistance monitor with sensors and automatic power cut-off has been developed to control the thickness of Pt-C shadow and C replica films in freeze-etching and related techniques. The monitor and sensors, in conjunction with newly modified evaporators, should considerably reduce the amount of C and Pt required and should prove useful in other applications employing vacuum evaporation of thin films of Pt, C, or other conducting materials.

摘要

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