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自凝义齿基托材料中残留单体的含量。

The level of residual monomer in self-curing denture-base materials.

作者信息

Fletcher A M, Purnaveja S, Amin W M, Ritchie G M, Moradians S, Dodd A W

出版信息

J Dent Res. 1983 Feb;62(2):118-20. doi: 10.1177/00220345830620020601.

Abstract

Because residual monomer may cause tissue irritation, we investigated two self-curing acrylic denture-base materials--one a compression type, and the other a pourable material--by means of gas-liquid chromatography. Both exhibited higher residual monomer levels than did heat-cured acrylics, with thick sections having lower values than did thin sections. The pourable material showed lower values than did the compression variety.

摘要

由于残留单体可能会引起组织刺激,我们通过气液色谱法研究了两种自凝丙烯酸义齿基托材料——一种是加压型,另一种是可灌注型。两种材料的残留单体含量均高于热凝丙烯酸树脂,厚截面的残留单体含量低于薄截面。可灌注型材料的残留单体含量低于加压型材料。

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