Endresen L, Bakka A, Glennås A, Tveit K M, Rugstad H E
Toxicol Appl Pharmacol. 1983 Feb;67(2):274-83. doi: 10.1016/0041-008x(83)90234-x.
Cultured cells can be adapted to large concentrations of the toxic cadmium ion, apparently by induction of synthesis of the Cd-binding protein metallothionein (MT). One human epithelial line derived from normal skin (HE100) and one murine fibroblast line, derived from L cells (C1 1D100), were used to study the stability of Cd resistance, the MT levels following omission of Cd, and the inducibility of MT synthesis in cells on reexposure to Cd. In the murine cells there was no significant loss of resistance during a 4-week period either after cultivation in vitro or after growing the cells in nude mice. In the human cells a decrease (50%) in resistance was noted the first week after Cd omission. After removing Cd from the cells, a rapid decrease in MT content was demonstrated. After 3 weeks of cultivation only trace amounts were left in both cell lines. However, approximately 60% (HE100) and 80% (C1 1D100) of the previous levels were demonstrated after reexposure to maximum tolerable doses for 24 hr. The data indicate that the degree of stability of Cd resistance is dependent on the capacity in cells for an immediate de novo synthesis of large amounts of MT on reexposure to Cd. The animal experiments demonstrate that Cd resistance is maintained even after growing the cells in vivo.
培养的细胞可以适应高浓度的有毒镉离子,显然是通过诱导合成与镉结合的金属硫蛋白(MT)来实现的。使用一种源自正常皮肤的人类上皮细胞系(HE100)和一种源自L细胞的小鼠成纤维细胞系(C1 1D100)来研究镉抗性的稳定性、去除镉后MT的水平以及细胞重新暴露于镉时MT合成的可诱导性。在小鼠细胞中,无论是在体外培养4周后还是在裸鼠体内培养细胞后,抗性都没有显著丧失。在人类细胞中,去除镉后的第一周,抗性下降了50%。从细胞中去除镉后,MT含量迅速下降。培养3周后,两个细胞系中都只剩下微量。然而,在重新暴露于最大耐受剂量24小时后,MT水平分别约为之前水平的60%(HE100)和80%(C1 1D100)。数据表明,镉抗性的稳定程度取决于细胞在重新暴露于镉时立即从头合成大量MT的能力。动物实验表明,即使在体内培养细胞后,镉抗性仍然得以维持。