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基于取代基效应的间位和对位二取代苯分配系数的分析与预测

Analysis and prediction of partition coefficients of meta- and para-disubstituted benzenes in terms of substituent effects.

作者信息

Fujita T

出版信息

J Pharm Sci. 1983 Mar;72(3):285-9. doi: 10.1002/jps.2600720319.

Abstract

The hydrophobic substituent parameter for a system of meta- and para-disubstituted benzenes, XC6H4Y, defined as pi X/PhY = log PXC6H4Y - log PC6H5Y, where P is the octanol-water partition coefficient and X and Y are variable and fixed substituents, respectively, varies from one system to another, according to the variation in substituent effects on the hydrogen bonding association of substituents with solvents. Using parameters from monosubstituted benzenes, pi X/PhH as the reference, the pi X values were analyzed by such relations as pi X/PhY = a pi X/PhH + rho Y sigma X + rho X sigma Y, where rho Y and rho X are susceptibilities of the relative hydrogen bonding association of substituents Y and X with two partitioning solvents to the electronic effect of X and Y, respectively. For substituents incapable of hydrogen bonding such as alkyl and halogen, the rho value is 0. The parameter a is a constant congruent to 1. The relationship was applied in calculating log P values of disubstituted benzenes.

摘要

间位和对位二取代苯体系XC6H4Y的疏水取代基参数定义为πX/PhY = log PXC6H4Y - log PC6H5Y,其中P为正辛醇-水分配系数,X和Y分别为可变取代基和固定取代基。该参数因体系而异,取决于取代基对取代基与溶剂间氢键缔合的影响变化。以单取代苯的参数πX/PhH为参考,通过πX/PhY = aπX/PhH + ρYσX + ρXσY等关系分析πX值,其中ρY和ρX分别是取代基Y和X与两种分配溶剂的相对氢键缔合对X和Y电子效应的敏感度。对于不能形成氢键的取代基,如烷基和卤素,ρ值为0。参数a为等于1的常数。该关系用于计算二取代苯的log P值。

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