Kumamoto Y
Health Phys. 1982 Apr;42(4):497-502. doi: 10.1097/00004032-198204000-00010.
Electrochemical etching of polycarbonate foils was performed using a KOH solution with a high concentration of methyl alcohol under different conditions of field strength, frequency, temperature and etching time. these studies showed that the highest neutron sensitivity relative to the inherent background in the foil was obtained under the following etching conditions: 52 kV/cm, 1 kHz, 30 degrees C, 30 min in a solution of 45 gm KOH + 80 cc CH3OH + 20 cc H2O. Under these conditions, 100 mrem of neutrons from a Ra-Be source gave 70 pits per cm2 while background was 7 +/- 3 pits per cm2 (10 +/- 5 mrem). The pit diameters were about 90 micrometers. This sensitivity (giving lowest measurable dose of 15 mrem) is quite sufficient for personnel neutron dosimetry applications and the size of the pits is large enough for easy counting using a microscope at a magnification of 40 X.
在不同的场强、频率、温度和蚀刻时间条件下，使用含有高浓度甲醇的氢氧化钾溶液对聚碳酸酯箔进行电化学蚀刻。这些研究表明，在以下蚀刻条件下可获得相对于箔片中固有本底的最高中子灵敏度：在含有45克氢氧化钾 + 80立方厘米甲醇 + 20立方厘米水的溶液中，场强为52千伏/厘米、频率为1千赫、温度为30摄氏度、蚀刻时间为30分钟。在这些条件下，来自镭 - 铍源的100毫雷姆中子产生每平方厘米70个蚀坑，而本底为每平方厘米7±3个蚀坑（10±5毫雷姆）。蚀坑直径约为90微米。这种灵敏度（可给出最低可测量剂量为15毫雷姆）对于人员中子剂量测定应用来说相当足够，并且蚀坑尺寸足够大，便于在40倍放大倍数下使用显微镜进行计数。
