Endo K, Sachdeva R, Araki Y, Ohno H
Department of Dental Materials Science, School of Dentistry, Health Sciences University of Hokkaido, Japan.
Dent Mater J. 1994 Dec;13(2):228-39. doi: 10.4012/dmj.13.228.
The structure of a titanium nitride film coated by arc ion plating on a Ni-50Ti shape memory alloy was characterized by X-ray photoelectron spectroscopy (XPS). The corrosion behavior of the titanium nitride-coated Ni-50Ti alloy was examined in 0.9% NaCl solution by potentiodynamic polarization measurements and a polarization resistance method. XPS spectra showed that the titanium nitride film consisted of three layers, a top layer of TiO2, a middle layer of TiNx (x > 1), and an inner layer of TiN. The passive current density for the titanium nitride-coated alloy was approximately two orders of magnitude lower than that of the polished alloy in the potential range from the free corrosion potential to +500 mV (vs. Ag/AgCl). Pitting corrosion associated with breakdown of the coated film occurred above this potential. The polarization resistance data also indicated that the corrosion rate of the titanium nitride-coated alloy at the free corrosion potential (+50-+100 mV) was more than one order of magnitude lower than that for the polished alloy.
采用X射线光电子能谱(XPS)对电弧离子镀在Ni-50Ti形状记忆合金上的氮化钛薄膜结构进行了表征。通过动电位极化测量和极化电阻法研究了氮化钛涂层Ni-50Ti合金在0.9% NaCl溶液中的腐蚀行为。XPS光谱表明,氮化钛薄膜由三层组成,顶层为TiO2,中间层为TiNx(x>1),内层为TiN。在从自腐蚀电位到+500 mV(相对于Ag/AgCl)的电位范围内,氮化钛涂层合金的钝化电流密度比抛光合金的钝化电流密度低约两个数量级。在此电位以上,会发生与涂层薄膜击穿相关的点蚀。极化电阻数据还表明,氮化钛涂层合金在自腐蚀电位(+50-+100 mV)下的腐蚀速率比抛光合金低一个多数量级。