Munakata N, Fitz-Jones P C, Young I E
Can J Microbiol. 1975 Jul;21(7):1129-32. doi: 10.1139/m75-166.
Bacillus subtilis strain UVS-42DPA is defective in both excision-repair capability and dipicolonic acid(DPA)accumulation. In sporulation medium, it forms spore-like bodies, which are sensitive to ultraviolet light (UV) as the vegetative cells and produce mostly cyclobutane dimers instead of "spore photoproduct" upon UV irradiation. The results suggest that the drastic change in the photochemical reactivity of DNA during sporulation might be induced and(or) maintained by the accumulation of DPA.
枯草芽孢杆菌菌株UVS - 42DPA在切除修复能力和二吡啶羧酸（DPA）积累方面均存在缺陷。在芽孢形成培养基中，它形成类芽孢体，这些类芽孢体对紫外线（UV）敏感，如同营养细胞一样，并且在紫外线照射后主要产生环丁烷二聚体而非“芽孢光产物”。结果表明，芽孢形成过程中DNA光化学反应性的剧烈变化可能是由DPA的积累诱导和（或）维持的。
