King N J, Mullbacher A, Tian L, Rodger J C, Lidbury B, Hla R T
Department of Pathology, University of Sydney, N.S.W., Australia.
J Reprod Immunol. 1993 Mar;23(2):131-44. doi: 10.1016/0165-0378(93)90003-z.
Day 3 post-coitum BALB/c and (BALB/c x CBA/H)F1 blastocysts were isolated and hatched in replicate wells. Some were treated with interferon-gamma (IFN-gamma). Whilst others were infected with West Nile Virus (WNV) at 100 plaque-forming units per cell, for 18 h. Controls were mock-treated. Gamma-irradiated (2000 rads) CBA/H, (paternal) WNV-specific and allo(CBA/H)-specific cytotoxic T (Tc) cells were then added to replicates of infected, mock-infected or IFN-gamma-treated cultures for 20 h. [3H]Thymidine was then added for a further 8 h. [3H]Thymidine incorporation was inhibited by 40-50% in WNV-infected cultures exposed to WNV-paternal-specific Tc cells and by 30-40% in WNV-infected cultures exposed to allo-paternal-specific Tc cells compared to similarly exposed, uninfected, or unexposed, WNV-infected, or unexposed, uninfected cultures. No significant differences in [3H]thymidine incorporation were found between these controls and IFN-gamma-treated cultures exposed to allo-paternal-specific Tc cells or IFN-gamma-treated cultures not exposed to Tc cells. Parallel exposure of L929 fibroblasts to the same Tc cells irradiated with 500-8000 rads in doubling doses, showed that irradiation did not alter the efficacy or specificity of the Tc cells. Relevance to maternal anti-viral immune responses during implantation is discussed.
交配后第3天,分离出BALB/c和(BALB/c×CBA/H)F1囊胚,并在重复孔中孵化。一些用γ干扰素(IFN-γ)处理。而其他的则以每细胞100个空斑形成单位感染西尼罗河病毒(WNV),持续18小时。对照组进行模拟处理。然后将经γ射线照射(2000拉德)的CBA/H(父本)、WNV特异性和同种(CBA/H)特异性细胞毒性T(Tc)细胞加入到感染、模拟感染或IFN-γ处理培养物的重复样本中,作用20小时。然后加入[3H]胸腺嘧啶核苷,再持续8小时。与同样暴露的未感染或未暴露的WNV感染培养物相比,暴露于WNV父本特异性Tc细胞的WNV感染培养物中[3H]胸腺嘧啶核苷掺入受到40%-50%的抑制,暴露于同种父本特异性Tc细胞的WNV感染培养物中受到30%-40%的抑制。在这些对照组与暴露于同种父本特异性Tc细胞的IFN-γ处理培养物或未暴露于Tc细胞的IFN-γ处理培养物之间,未发现[3H]胸腺嘧啶核苷掺入有显著差异。将L929成纤维细胞以双倍剂量平行暴露于用500-8000拉德照射的相同Tc细胞,结果表明照射并未改变Tc细胞的效力或特异性。文中讨论了其与植入期间母体抗病毒免疫反应的相关性。