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强烈阳光照射对后天性黑素细胞痣表皮透光显微镜特征表达的关键影响。

Critical effects of intense sun exposure on the expression of epiluminescence microscopy features of acquired melanocytic nevi.

作者信息

Stanganelli I, Bauer P, Bucchi L, Serafini M, Cristofolini P, Rafanelli S, Cristofolini M

机构信息

Department of Prevention, Ravenna Health Care District, Italy.

出版信息

Arch Dermatol. 1997 Aug;133(8):979-82.

PMID:9267243
Abstract

BACKGROUND

Current knowledge of the histologic counterparts of epiluminescence microscopy (ELM) features in pigmented skin lesions is limited. As a particular aspect of this problem, the transient effects of intense sun exposure on the morphological characteristics of melanocytic nevi may influence the expression of ELM features as well as the demonstration of stable and consistent histologic correlates.

OBSERVATIONS

Forty melanocytic nevi from 11 subjects living in Northern Italy were examined by digital ELM before and after 5 to 13 days of sun exposure at latitudes of 5 degrees north to 3 degrees south. A number of multifaceted changes were observed. In particular, 3 lesions showed the expression of some structures compatible with radial streaming, pseudopods, and gray-blue areas. These features are considered to have often severe histologic correlates. In a third image, obtained 5 to 6 weeks later, they showed partial or total regression. Another case showed a massive regression of the pigment network as a result of a progressive inflammatory reaction with marked asymmetry in the distribution of pigmentation.

CONCLUSIONS

Digital ELM has the potential to detect subtle changes in the structure of nevi after intense sun exposure. The transient observation of certain ELM features often associated with severe histologic substrates casts doubts on the ability of ELM to characterize sun-exposed nevi by a single examination.

摘要

背景

目前对于色素沉着性皮肤病变中表皮透光显微镜检查(ELM)特征的组织学对应物的了解有限。作为这个问题的一个特定方面,强烈阳光照射对黑素细胞痣形态特征的短暂影响可能会影响ELM特征的表达以及稳定一致的组织学相关性的显示。

观察结果

对11名居住在意大利北部的受试者的40个黑素细胞痣在北纬5度至南纬3度的纬度下进行5至13天阳光照射前后进行数字ELM检查。观察到许多多方面的变化。特别是,3个病变显示出一些与放射状流、伪足和灰蓝色区域相符的结构的表达。这些特征通常被认为具有严重的组织学相关性。在5至6周后获得的第三张图像中,它们显示出部分或完全消退。另一例显示由于渐进性炎症反应导致色素网络大量消退,色素沉着分布明显不对称。

结论

数字ELM有潜力检测强烈阳光照射后痣结构的细微变化。对某些通常与严重组织学基质相关的ELM特征的短暂观察使人对ELM通过单次检查对阳光照射后的痣进行特征化的能力产生怀疑。

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