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双层膜在二氧化硅上的物理吸附

Physical Adsorption of Bilayer Membranes on Silica.

作者信息

Rapuano R, Carmona-Ribeiro AM

机构信息

Instituto de Quimica, Universidade de Sao Paulo, Sao Paulo, 05599-970, Brazil

出版信息

J Colloid Interface Sci. 1997 Sep 1;193(1):104-11. doi: 10.1006/jcis.1997.5060.

Abstract

Isotherms for adsorption of bilayer-forming synthetic amphiphiles or phospholipids from vesicles onto hydrophilic silica particles (Aerosil OX-50) are obtained over a range of experimental conditions. Phosphatidylcholine (PC), dipalmitoylphosphatidylcholine (DPPC), dihexadecylphosphate (DHP), and dioctadecyldimethylammonium bromide (DODAB) dispersed in 10 mM Tris, pH 7.4, as small unilamellar vesicles present affinities for silica following the sequence DODAB > DPPC > PC > DHP. Among these, only DHP adsorption is below that expected for one bilayer deposition. Interaction at 65degreesC for 1 h between DPPC (or, at 25degreesC, for PC) vesicles and silica efficiently leads to bilayer deposition at maximal adsorption, if Tris is the buffer used. Preliminary centrifugation of the PC or DPPC vesicle dispersion is necessary to prevent overestimated adsorption. PC affinity for silica and its deposition as a bilayer depend on the nature of buffer used being much higher for Tris than for Hepes at pH 7.4. Formation of ion pairs between protonated amino groups in Tris and silanol groups on silica may lead to Tris adsorption and an increase in density of -OH groups on the solid surface. Therefore, formation of cooperative hydrogen bridges between -P=O in the phosphatidyl of the phospholipid bilayer and the -OH groups of Tris adsorbed on silica increases PC affinity for silica in the presence of Tris. For Hepes as buffer, PC affinity for silica is much lower and no plateau indicative of bilayer deposition is observed in the adsorption isotherm. Stabilization of supported phospholipid bilayers on solid surfaces requires several cooperative hydrogen bridges between the phospholipid and the solid surface. DODAB adsorption was unaffected by vesicle age and physical state of the bilayer vesicle. Adsorption isotherms for DODAB are of the high-affinity type with a maximum indicative of competition between intervesicle interactions and DODAB deposition on silica. Stabilization of DODAB bilayer deposition requires surface charge densities on silica higher than -1 μC/cm2. Copyright 1997Academic Press

摘要

在一系列实验条件下,获得了双层形成的合成两亲分子或磷脂从囊泡吸附到亲水性二氧化硅颗粒(气相二氧化硅OX - 50)上的等温线。分散在10 mM Tris(pH 7.4)中的磷脂酰胆碱(PC)、二棕榈酰磷脂酰胆碱(DPPC)、磷酸二己酯(DHP)和二辛基二甲基溴化铵(DODAB)作为小单层囊泡,对二氧化硅的亲和力顺序为DODAB > DPPC > PC > DHP。其中,只有DHP的吸附低于单层沉积预期值。如果使用Tris作为缓冲液,在65℃下DPPC囊泡(或在25℃下PC囊泡)与二氧化硅之间相互作用1小时,在最大吸附时可有效导致双层沉积。对PC或DPPC囊泡分散液进行初步离心对于防止吸附量高估是必要的。PC对二氧化硅的亲和力及其作为双层的沉积取决于所用缓冲液的性质,在pH 7.4时,Tris缓冲液中的亲和力比Hepes缓冲液中的高得多。Tris中质子化氨基与二氧化硅上硅醇基团之间形成离子对可能导致Tris吸附,并使固体表面 - OH基团密度增加。因此,在Tris存在下,磷脂双层磷脂酰中的 - P = O与吸附在二氧化硅上的Tris的 - OH基团之间形成协同氢键会增加PC对二氧化硅的亲和力。对于Hepes作为缓冲液,PC对二氧化硅的亲和力要低得多,并且在吸附等温线中未观察到表明双层沉积的平台期。在固体表面上稳定支持的磷脂双层需要磷脂与固体表面之间形成几个协同氢键。DODAB的吸附不受囊泡年龄和双层囊泡物理状态的影响。DODAB的吸附等温线属于高亲和力类型,其最大值表明囊泡间相互作用与DODAB在二氧化硅上沉积之间存在竞争。稳定DODAB双层沉积需要二氧化硅表面电荷密度高于 - 1 μC/cm²。版权所有1997学术出版社

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