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链霉菌中新型复制后DNA修饰:质粒pIJ101优先修饰位点的分析

Novel post-replicative DNA modification in Streptomyces: analysis of the preferred modification site of plasmid pIJ101.

作者信息

Dyson P, Evans M

机构信息

Molecular Biology Research Group, School of Biological Sciences, University of Wales Swansea, Singleton Park, Swansea SA2 8PP, UK.

出版信息

Nucleic Acids Res. 1998 Mar 1;26(5):1248-53. doi: 10.1093/nar/26.5.1248.

Abstract

Both Streptomyces lividans and Streptomyces avermitilis have the ability to site specifically modify their DNA, rendering it susceptible to in vitro Tris-dependent double-strand cleavage. We have cloned a 160 bp fragment containing the preferred modification site of plasmid pIJ101 and, employing an in vitro primer extension assay, determined that the modifications occur at guanine residues on either strand separated by 3 bp. These guanines are located within a 6 bp palindromic 'core' sequence. A cloned copy of a 35 bp region of the plasmid containing this core sequence was not recognized by the modifying activity in vivo. To further investigate the nature of the site specificity a set of deletion mutants of the 160 bp sequence were analysed. This revealed that a substantial portion of this sequence is essential for authentic modification. The essential region contains three 13 bp direct repeats, the central one containing the core sequence, while the left-hand and right-hand copies overlap two potential stem-loop structures. Deletion of either left- or right-hand repeat structures abolishes modification within the core sequence, although the left-hand deletion resulted in modification at a secondary site within the right-hand direct repeat. These data support a post-replicative mechanism of modification, underlined by the observation that the modifications are not detected in single-stranded plasmid replication intermediates.

摘要

变铅青链霉菌和阿维链霉菌都具有对其DNA进行位点特异性修饰的能力,使其易于在体外进行依赖于Tris的双链切割。我们克隆了一个包含质粒pIJ101的首选修饰位点的160 bp片段,并采用体外引物延伸试验确定修饰发生在两条链上相隔3 bp的鸟嘌呤残基处。这些鸟嘌呤位于一个6 bp的回文“核心”序列内。含有该核心序列的质粒35 bp区域的克隆拷贝在体内未被修饰活性识别。为了进一步研究位点特异性的本质,分析了一组160 bp序列的缺失突变体。这表明该序列的很大一部分对于真实修饰是必不可少的。必需区域包含三个13 bp的直接重复序列,中间的一个包含核心序列,而左侧和右侧的拷贝与两个潜在的茎环结构重叠。删除左侧或右侧的重复结构会消除核心序列内的修饰,尽管左侧删除导致右侧直接重复序列内的一个次要位点发生修饰。这些数据支持复制后修饰机制,这一点从在单链质粒复制中间体中未检测到修饰这一观察结果得到强调。

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