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聚苯乙烯颗粒在玻璃上的沉积和再沉积中的位点选择性

Site Selectivity in the Deposition and Redeposition of Polystyrene Particles to Glass.

作者信息

Wit PJ, Busscher HJ

机构信息

Laboratory for Materia Technica, University of Groningen, Bloemsingel 10, Groningentrade markhe, 9712 KZ, Netherlands

出版信息

J Colloid Interface Sci. 1998 Dec 1;208(1):351-352. doi: 10.1006/jcis.1998.5822.

Abstract

The site selectivity in the deposition and redeposition of negatively charged, polystyrene particles to a glass collector surface was studied under flow, by first depositing particles to the collector surface and then removing them by passing of an air-liquid interface. Using an image analysis system, the coordinates of the occupied sites were memorized and subsequently the probability of redeposition on these sites relative to deposition on other collector surface areas was determined. In low ionic strength buffers, 20 and 30 mM KNO3, redeposition probabilities on previously occupied sites were up to 51 times higher than for deposition elsewhere, while in high ionic strengths buffers (above 30 mM) redeposition probabilities were essentially similar as for deposition on other collector surface sites. It is suggested that high affinity sites for particle deposition exist on glass, on which preferential (re)deposition is mediated through attractive electrostatic interactions. Although such a suggestion is not new, this is the first time supporting evidence has been collected through redeposition experiments as described here. Copyright 1998 Academic Press.

摘要

通过流动状态下将带负电荷的聚苯乙烯颗粒沉积并再沉积到玻璃收集器表面的方式,研究了其位点选择性。具体操作是先将颗粒沉积到收集器表面,然后通过气液界面使其脱离。使用图像分析系统记录被占据位点的坐标,随后确定这些位点上再沉积的概率相对于收集器其他表面区域沉积概率的情况。在低离子强度缓冲液(20 mM和30 mM硝酸钾)中,先前被占据位点上的再沉积概率比其他地方的沉积概率高出51倍,而在高离子强度缓冲液(高于30 mM)中,再沉积概率与在收集器其他表面位点上的沉积概率基本相似。研究表明,玻璃表面存在颗粒沉积的高亲和力位点,通过有吸引力的静电相互作用介导优先(再)沉积。尽管这一观点并不新颖,但这是首次通过此处所述的再沉积实验收集到支持证据。版权所有1998年学术出版社。

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