Masens C, Schulte J, Phillips M, Dligatch S
Department of Applied Physics, University of Technology, P.O. Box 123 Broadway, Sydney, New South Wales 2007, Australia
Microsc Microanal. 2000 Mar;6(2):113-120. doi: 10.1007/s100059910010.
The preparation of ultra flat gold surfaces for use in chemical force microscopy (CFM) has been studied. The surfaces were studied in terms of substrate effects by comparing mica, Si (110) wafer and glass slides. The effect of different annealing regimes was also investigated. Measurements on these surfaces were made by both atomic force microscopy (AFM) (in contact and tapping mode) and by scanning tunneling microscopy (STM). The films contain different morphologies with respect to grain size and topography. Calculations of surface roughness present values less than 2.5 nm for all surfaces studied, making the choice of the "flattest" surface difficult if based on criteria of surface roughness alone. Additionally, it is shown that different acquisition parameters can produce dissimilar images that have stability and reproducibility.
对用于化学力显微镜（CFM）的超平金表面的制备进行了研究。通过比较云母、硅（110）晶片和载玻片，从基底效应方面对这些表面进行了研究。还研究了不同退火方式的影响。通过原子力显微镜（AFM）（接触模式和轻敲模式）以及扫描隧道显微镜（STM）对这些表面进行了测量。这些薄膜在晶粒尺寸和形貌方面呈现出不同的形态。对所有研究表面的表面粗糙度计算得出的值均小于2.5纳米，因此如果仅基于表面粗糙度标准来选择“最平”的表面会很困难。此外，研究表明不同的采集参数会产生具有稳定性和可重复性的不同图像。
