Winder C L, Al-Adham I S, Abdel Malek S M, Buultjens T E, Horrocks A J, Collier P J
Division of Molecular and Life Sciences, School of Science and Engineering, University of Abertay Dundee, UK.
J Appl Microbiol. 2000 Aug;89(2):289-95. doi: 10.1046/j.1365-2672.2000.01119.x.
Benzisothiazolone (BIT), N-methylisothiazolone (MIT) and 5-chloro-N-methylisothiazolone (CMIT) are highly effective biocidal agents and are used as preservatives in a variety of cosmetic preparations. The isothiazolones have proven efficacy against many fungal and bacterial species including Pseudomonas aeruginosa. However, some species are beginning to exhibit resistance towards this group of compounds after extended exposure. This experiment induced resistance in cultures of Ps. aeruginosa exposed to incrementally increasing sub-minimum inhibitory concentrations (MICs) of the isothiazolones in their pure chemical forms. The induced resistance was observed as a gradual increase in MIC with each new passage. The MICs for all three test isothiazolones and a thiol-interactive control compound (thiomersal) increased by approximately twofold during the course of the experiment. The onset of resistance was also observed by reference to the altered presence of an outer membrane protein, designated the T-OMP, in SDS-PAGE preparations. T-OMP was observed to disappear from the biocide-exposed preparations and reappear when the resistance-induced cultures were passaged in the absence of biocide. This reappearance of T-OMP was not accompanied by a complete reversal of induced resistance, but by a small decrease in MIC. The induction of resistance towards one biocide resulted in the development of cross-resistance towards other members of the group and the control, thiomersal. It has been suggested that the disappearance of T-OMP from these preparations is associated with the onset of resistance to the isothiazolones in their Kathon form (CMIT and MIT).
苯并异噻唑啉酮(BIT)、N-甲基异噻唑啉酮(MIT)和5-氯-N-甲基异噻唑啉酮(CMIT)是高效的杀生物剂,在多种化妆品制剂中用作防腐剂。异噻唑啉酮已被证明对包括铜绿假单胞菌在内的许多真菌和细菌具有功效。然而,一些菌种在长期接触后开始对这类化合物表现出抗性。本实验在暴露于逐步增加的异噻唑啉酮纯化学形式的亚最低抑菌浓度(MIC)下,诱导铜绿假单胞菌培养物产生抗性。观察到诱导抗性表现为每次传代时MIC逐渐增加。在实验过程中,所有三种受试异噻唑啉酮和一种硫醇相互作用对照化合物(硫柳汞)的MIC增加了约两倍。通过参考十二烷基硫酸钠-聚丙烯酰胺凝胶电泳(SDS-PAGE)制剂中一种名为T-OMP的外膜蛋白的存在变化,也观察到了抗性的产生。在暴露于杀生物剂的制剂中观察到T-OMP消失,而当抗性诱导培养物在无杀生物剂的情况下传代时,T-OMP重新出现。T-OMP的这种重新出现并没有伴随着诱导抗性的完全逆转,而是MIC略有下降。对一种杀生物剂的抗性诱导导致对该组其他成员和对照硫柳汞产生交叉抗性。有人认为,这些制剂中T-OMP的消失与对卡松形式(CMIT和MIT)的异噻唑啉酮产生抗性有关。