Kang W N, Kim H J, Choi E M, Jung C U, Lee S I
National Creative Research Initiative Center for Superconductivity, Department of Physics, Pohang University of Science and Technology, Pohang 790-784, Korea.
Science. 2001 May 25;292(5521):1521-3. doi: 10.1126/science.1060822. Epub 2001 Apr 12.
We fabricated high-quality c axis-oriented epitaxial MgB2 thin films using a pulsed laser deposition technique. The thin films grown on (1 i 0 2) Al2O3 substrates have a transition temperature of 39 kelvin. The critical current density in zero field is approximately 6 x 10(6) amperes per cubic centimeter at 5 kelvin and approximately 3 x 10(5) amperes per cubic centimeter at 35 kelvin, which suggests that this compound has potential for electronic device applications, such as microwave devices and superconducting quantum interference devices. For the films deposited on Al2O3, x-ray diffraction patterns indicate a highly c axis-oriented crystal structure perpendicular to the substrate surface.
我们使用脉冲激光沉积技术制备了高质量的c轴取向外延MgB₂薄膜。在(1 i 0 2) Al₂O₃衬底上生长的薄膜的转变温度为39开尔文。零场下的临界电流密度在5开尔文时约为6×10⁶安培每立方厘米,在35开尔文时约为3×10⁵安培每立方厘米,这表明该化合物在电子器件应用方面具有潜力,如微波器件和超导量子干涉器件。对于沉积在Al₂O₃上的薄膜,X射线衍射图谱表明存在垂直于衬底表面的高度c轴取向晶体结构。