Wu Hongkai, Odom Teri W, Whitesides George M
Department of Chemistry and Chemical Biology, Harvard University, Cambridge, Massachusetts 02138, USA.
Anal Chem. 2002 Jul 15;74(14):3267-73. doi: 10.1021/ac020151f.
This paper describes the application of reduction photolithography, using arrays of microlenses and gray scale masks, to generate arrays of micropatterns having multilevel and curved features in photoresist. This technique can fabricate, in a single exposure, three-dimensional microstructures (e.g., nonspherical microlens arrays) over areas of approximately 2 x 2 cm2. The simple optical configuration consisted of transparency film (having centimeter-sized features) as gray scale photomasks, an overhead projector as the illumination source, and arrays of microlenses as the size-reducing elements. Arrays of 40- and 100-microm lenses achieved a lateral size reduction of approximately 10(3) and generated patterns of well-defined, multilevel structures; these structures may find use in applications such as diffractive optics.
本文描述了采用微透镜阵列和灰度掩模的还原光刻技术在光刻胶中生成具有多级和弯曲特征的微图案阵列的应用。该技术能够在单次曝光中，在约2×2平方厘米的区域上制造三维微结构（例如非球面微透镜阵列）。简单的光学配置包括作为灰度光掩模的透明薄膜（具有厘米级特征）、作为照明源的投影仪以及作为尺寸缩小元件的微透镜阵列。40微米和100微米的透镜阵列实现了约10³的横向尺寸缩小，并生成了定义明确的多级结构图案；这些结构可用于诸如衍射光学等应用中。
