Droffner M L, Yamamoto N
Woods End Research Laboratory, Mt. Vernon, Maine 04234.
Curr Microbiol. 1992 Nov;25(5):257-60. doi: 10.1007/BF01575858.
Salmonella typhimurium thermotolerant mutants dependent on the presence of nalidixic acid for growth at 48 degrees C were isolated and designated nalidixic acid-dependent, thermotolerant mutants, naldttl. Genetic mapping revealed that naldttl alleles map within the gyrA gene. When S. typhimurium strain Q was plated in the dark on nutrient agar containing nalidixic acid (20 micrograms/ml) as a photosensitizer and briefly exposed to white light or near VU light prior to incubation at 42 degrees C, nalidixic acid-resistant mutants arose in about 16 h at frequencies of 5 x 10(-8) for white light and 1 x 10(-6) for near UV light. About 10% of these nalidixic acid-resistant mutants derived from photodynamic mutagenesis exhibited the thermotolerant characteristic.
分离出了鼠伤寒沙门氏菌耐热突变体,它们在48℃生长依赖于萘啶酸的存在,并被命名为萘啶酸依赖型耐热突变体,即naldttl。遗传图谱显示naldttl等位基因定位于gyrA基因内。当鼠伤寒沙门氏菌菌株Q在黑暗中接种于含有萘啶酸(20微克/毫升)作为光敏剂的营养琼脂平板上,并在42℃培养前短暂暴露于白光或近紫外光下时,大约16小时后出现了萘啶酸抗性突变体,白光照射下的频率为5×10⁻⁸,近紫外光照射下的频率为1×10⁻⁶。这些由光动力诱变产生的萘啶酸抗性突变体中约10%表现出耐热特性。