Hayakawa Tohru, Yoshinari Masao, Nemoto Kimiya
Department of Dental Materials, Research Institute of Oral Science, Nihon University School of Dentistry at Matsudo, 2-870-1, Sakaecho-nishi, Matsudo, Chiba 271-8587, Japan.
Biomaterials. 2004 Jan;25(1):119-27. doi: 10.1016/s0142-9612(03)00484-8.
Plasma polymerized hexamethyldisiloxane (HMDSO) thin film was deposited onto titanium using a radio-frequency apparatus for the surface modification of titanium. A titanium disk was first polished using colloidal silica at pH=9.8. Plasma-polymerized HMDSO films were firmly attached to the titanium by heating the titanium to a temperature of approximately 250 degrees C. The thickness of the deposited film was 0.07-0.35mum after 10-60min of plasma polymerization. The contact angle with respect to double distilled water significantly increased after HMDSO coating. X-ray photoelectron spectroscopy revealed that the deposited thin film consisted of Si, C, and O atoms. No Ti peaks were observed on the deposited surface. The deposited HMDSO film was stable during 2-weeks immersion in phosphate buffer saline solution. Fourier transform reflection-absorption spectroscopy showed the formation of Si-H, Si-C, C-H, and Cz.dbnd6;O bonds in addition to Si-O-Si bonds. Quartz crystal microbalance-dissipation measurement demonstrated that the deposition of HMDSO thin films on titanium has a benefit for fibronectin adsorption at the early stage. In conclusion, plasma polymerization is a promising technique for the surface modification of titanium. HMDSO-coated titanium has potential application as a dental implant material.
使用射频设备将等离子体聚合六甲基二硅氧烷（HMDSO）薄膜沉积在钛上，用于钛的表面改性。首先使用pH = 9.8的胶体二氧化硅对钛盘进行抛光。通过将钛加热到约250摄氏度，使等离子体聚合的HMDSO薄膜牢固地附着在钛上。经过10 - 60分钟的等离子体聚合后，沉积薄膜的厚度为0.07 - 0.35μm。HMDSO涂层后，与双蒸水的接触角显著增加。X射线光电子能谱显示，沉积的薄膜由Si、C和O原子组成。在沉积表面未观察到Ti峰。沉积的HMDSO薄膜在磷酸盐缓冲盐溶液中浸泡2周期间保持稳定。傅里叶变换反射吸收光谱表明，除了Si - O - Si键外，还形成了Si - H、Si - C、C - H和C═O键。石英晶体微天平耗散测量表明，HMDSO薄膜在钛上的沉积有利于早期纤连蛋白的吸附。总之，等离子体聚合是一种有前景的钛表面改性技术。HMDSO涂层钛作为牙科植入材料具有潜在应用价值。
