Sissons C H, Cutress T W, Faulds G, Wong L
HRC Dental Research Unit, Wellington School of Medicine, Otago University, New Zealand.
Arch Oral Biol. 1992 Nov;37(11):913-22. doi: 10.1016/0003-9969(92)90062-d.
Artificial microcosm plaques were grown in a five-plaque culture system for up to 6 weeks, reaching a maximum depth of several mm. Procedures for long-term pH measurement with glass electrodes were established; they showed that the application of 5 or 10% sucrose for 6 min with a slow continuous flow of a basal medium containing mucin (BMM) generated the pH changes characteristic of in vivo Stephan curves. These pH responses were reproducible between plaques. Plaque mass and thickness were critical variables. Successive, sucrose-induced pH curves in plaques up to 4 mm thickness showed minor reductions only in the amplitude and rates of pH change. In plaques over 4 mm thick there was a pronounced reduction in pH response to successive sucrose applications, indicating increased diffusion limitations--a result of plaque growth to seal in the freshly-inserted pH electrode. In plaques of 6 mm maximum thickness, 10% sucrose induced a decrease to below pH 5.5 lasting 24 h, compared to the pH response in 2 mm thick plaque, which returned to the resting pH in 2 h. Differences in pH of up to 0.9 units were identified in thick plaques between inner and outer layers. The BMM flow rate was a critical determinant of the amplitude of the pH response to sucrose and subsequent return to resting pH. These results confirm, for microcosm plaque, the importance of clearance dynamics and diffusion-limited gradients in regulating plaque pH.
人工微观菌斑在五菌斑培养系统中培养长达6周,最大深度达几毫米。建立了使用玻璃电极进行长期pH测量的方法;结果表明,在含有粘蛋白的基础培养基(BMM)缓慢连续流动的情况下,施加5%或10%的蔗糖6分钟会产生体内Stephan曲线特有的pH变化。这些pH反应在菌斑之间具有可重复性。菌斑质量和厚度是关键变量。厚度达4毫米的菌斑中,连续的蔗糖诱导pH曲线仅在pH变化幅度和速率上有轻微降低。在厚度超过4毫米的菌斑中,对连续蔗糖施加的pH反应明显降低,表明扩散限制增加,这是菌斑生长以封闭新插入的pH电极的结果。在最大厚度为6毫米的菌斑中,10%的蔗糖会导致pH降至5.5以下并持续24小时,相比之下,2毫米厚菌斑的pH反应在2小时内恢复到静息pH。在厚菌斑的内层和外层之间,pH差异高达0.9个单位。BMM流速是蔗糖诱导的pH反应幅度以及随后恢复到静息pH的关键决定因素。这些结果证实,对于微观菌斑,清除动力学和扩散限制梯度在调节菌斑pH方面具有重要意义。