Lee Jae P, Sung Myung M
Department of Chemistry, Kookmin University, Chongnung-dong, Songbuk-ku, Seoul 136-702, Korea.
J Am Chem Soc. 2004 Jan 14;126(1):28-9. doi: 10.1021/ja038769+.
We report a new patterning method using photocatalytic lithography of alkylsiloxane self-assembled monolayers and selective atomic layer deposition of thin films. The photocatalytic lithography is based on the fact that the decomposition rate of the alkylsiloxane monolayers in contact with TiO2 is much faster than that with SiO2 under UV irradiation in air. The photocatalytic lithography, using a quartz plate coated with patterned TiO2 thin films, was done to prepare patterned monolayers of the alkylsiloxane on Si substrates. A ZrO2 thin film was selectively deposited onto the monolayer-patterned Si substrate by atomic layer deposition.
我们报道了一种新的图案化方法，该方法利用烷基硅氧烷自组装单分子层的光催化光刻技术和薄膜的选择性原子层沉积技术。光催化光刻基于这样一个事实：在空气中紫外线照射下，与TiO₂接触的烷基硅氧烷单分子层的分解速率比与SiO₂接触时快得多。使用涂有图案化TiO₂薄膜的石英板进行光催化光刻，以在硅衬底上制备烷基硅氧烷的图案化单分子层。通过原子层沉积将ZrO₂薄膜选择性地沉积到具有单分子层图案的硅衬底上。
