Park Mi H, Jang Young J, Sung-Suh Hyung M, Sung Myung M
Department of Chemistry, Kookmin University, Chongnung-dong, Songbuk-ku, Seoul 136-702, Korea.
Langmuir. 2004 Mar 16;20(6):2257-60. doi: 10.1021/la035760c.
We demonstrate a selective atomic layer deposition of TiO2 thin films on patterned alkylsiloxane self-assembled monolayers. Microcontact printing was done to prepare patterned monolayers of the alkylsiloxane on Si substrates. The patterned monolayers define and direct the selective deposition of the TiO2 thin film using atomic layer deposition. The selective atomic layer deposition is based on the fact that the TiO2 thin film is selectively deposited only on the regions exposing the silanol groups of the Si substrates because the regions covered with the alkylsiloxane monolayers do not have any functional group to react with precursors.
我们展示了在图案化的烷基硅氧烷自组装单分子层上选择性原子层沉积TiO₂薄膜的过程。通过微接触印刷在硅衬底上制备烷基硅氧烷的图案化单分子层。这些图案化单分子层利用原子层沉积来定义和引导TiO₂薄膜的选择性沉积。选择性原子层沉积基于这样一个事实：TiO₂薄膜仅选择性地沉积在暴露硅衬底硅醇基团的区域，因为被烷基硅氧烷单分子层覆盖的区域没有任何官能团与前驱体发生反应。
