Brack Hans-Peter, Padeste Celestino, Slaski Michal, Alkan Selmiye, Solak Harun H
Electrochemistry Laboratory, Paul Scherrer Institut, CH-5232 Villigen PSI, Switzerland.
J Am Chem Soc. 2004 Feb 4;126(4):1004-5. doi: 10.1021/ja0379870.
In this work a simple novel method for preparing micro- and nanoscale patterns of polymer chains grafted onto flexible polymer substrates is described. A combination of the two techniques of radiation grafting and "grafting-from" has been made. This combination makes it possible to prepare grafted structures having micro- or nanoscale lateral dimensions that are determined by the electron beam or X-ray irradiation patterns used. The height of the grafted features can be controlled by the irradiation dose or such grafting reaction conditions as time, temperature, or monomer concentration. Our first results for nanopatterned samples demonstrate resolution comparable to those of other polymer-based lithography processes.
