Shankar S Shiv, Rizzello Loris, Cingolani Roberto, Rinaldi Ross, Pompa Pier Paolo
National Nanotechnology Laboratory of CNR-INFM, IIT Research Unit, Via Arnesano 16, 73100 Lecce, Italy.
ACS Nano. 2009 Apr 28;3(4):893-900. doi: 10.1021/nn900077s.
The ability to precisely control the pattern of different metals at the micro- and nanoscale, along with their topology, has been demonstrated to be essential for many applications, ranging from material science to biomedical devices, electronics, and photonics. In this work, we show a novel approach, based on a combination of lithographic techniques and galvanic displacement reactions, to fabricate micro- and nanoscale patterns of different metals, with highly controlled surface roughness, onto a number of suitable substrates. We demonstrate the possibility to exploit such metal films to achieve significant fluorescence enhancement of nearby fluorophores, while maintaining accurate spatial control of the process, from submicron resolution to centimeter-sized features. These patterns may be also exploited for a wide range of applications, including SERS, solar cells, DNA microarray technology, hydrophobic/hydrophilic substrates, and magnetic devices.
在从材料科学到生物医学设备、电子学和光子学等众多应用中，精确控制不同金属在微米和纳米尺度上的图案及其拓扑结构的能力已被证明至关重要。在这项工作中，我们展示了一种基于光刻技术和电化置换反应相结合的新颖方法，用于在多种合适的基板上制造具有高度可控表面粗糙度的不同金属的微米和纳米尺度图案。我们证明了利用这种金属膜实现附近荧光团显著荧光增强的可能性，同时在从亚微米分辨率到厘米尺寸特征的过程中保持精确的空间控制。这些图案还可用于广泛的应用，包括表面增强拉曼光谱（SERS）、太阳能电池、DNA微阵列技术、疏水/亲水基板和磁性设备。
