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[遗传有害暴露诱导的DNA修复对含有细胞的培养基离子强度的依赖性]

[The dependence of DNA repair induced by genetically hazardous exposures on the ionic strength of the medium containing the cells].

作者信息

Spitkovskiĭ D M, Ermakov A V, Gorin A I, Pospekhova N I, Prokhorov A Iu

出版信息

Tsitologiia. 1992;34(7):76-85.

PMID:1475855
Abstract

The dependence of UV-induced unscheduled DNA synthesis (UDS) in non-stimulated lymphocytes of human peripheral blood on the ionic strength (mu) of the culture medium has been shown. With the level of mu lower or higher than physiological (mu ph) the UDS significantly decreases. The effect of modification of mu due to changes in ionic strength is absent in the lymphocytes of patients with the classic form of xeroderma pigmentosum. This phenomenon may become useful for development of a new test revealing cells with genetically or physiologically changed system of UV-induced DNA repair. Mechanisms of investigated phenomenon, particularly their dependence on the chromatin structure, as well as the influence of ionic strength on binding the repair enzymes with DNA are discussed.

摘要

已经表明,人外周血未受刺激的淋巴细胞中紫外线诱导的非定标性DNA合成(UDS)对培养基离子强度(μ)具有依赖性。当μ水平低于或高于生理水平(μph)时,UDS会显著降低。典型型着色性干皮病患者的淋巴细胞不存在因离子强度变化而导致的μ改变效应。这一现象可能有助于开发一种新的检测方法,以揭示具有遗传或生理改变的紫外线诱导DNA修复系统的细胞。文中讨论了所研究现象的机制,特别是它们对染色质结构的依赖性,以及离子强度对修复酶与DNA结合的影响。

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1
[The dependence of DNA repair induced by genetically hazardous exposures on the ionic strength of the medium containing the cells].[遗传有害暴露诱导的DNA修复对含有细胞的培养基离子强度的依赖性]
Tsitologiia. 1992;34(7):76-85.
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