Yagi K, Yamanaka A, Homma I
Physics Department, Tokyo Institute of Technology, Japan.
Microsc Res Tech. 1992 Feb 15;20(4):333-40. doi: 10.1002/jemt.1070200404.
Reflection electron microscope studies of surface dynamic processes are reviewed and illustrated with recent new observations. They include: surface electromigration and current dependent structures of Si surfaces; surface etching by oxidation of Si surface; and growth of two dimensional alloyed adsorbate by co-deposition of metals on Si surface. The observations revealed details of the surface dynamic processes, which are difficult to obtain with other surface analysis techniques.
本文回顾了利用反射电子显微镜对表面动态过程的研究,并展示了近期的新观察结果。这些研究包括:硅表面的表面电迁移和与电流相关的结构;硅表面氧化引发的表面蚀刻;以及通过在硅表面共沉积金属来生长二维合金吸附物。这些观察结果揭示了表面动态过程的细节,而这些细节是其他表面分析技术难以获得的。