Tatoulian M, Bouloussa O, Morière F, Arefi-Khonsari F, Amouroux J, Rondelez F
Laboratoire de Physico Chimie Curie, Institut Curie, 11 rue Pierre et Marie Curie, 75005 Paris, France.
Langmuir. 2004 Nov 23;20(24):10481-9. doi: 10.1021/la030378l.
Low-pressure low-frequency NH3 plasmas have been used for the surface modification of bulk polyethylene films and of octadecyltrichlorosilane (OTS) self-assembled monolayers deposited on oxidized silicon wafers. The incorporation of nitrogen-containing groups by the plasma treatment has been followed by contact angle measurements and by X-ray photoelectron spectroscopy. The surface degradation of the OTS monolayers due to plasma etching has been measured separately by optical ellipsometry with subnanometric accuracy. Our data show clear evidence for the existence of an optimum treatment time, yielding a high density of NH2 functional groups without significant variation of the structural features of the organic material. Self-assembled monolayers appear as excellent model systems to characterize the effects of plasma discharges on polyolefins. In particular, they allow testing the influence of molecular orientation, packing density, and crystallinity on the final results.
低压低频氨等离子体已被用于对块状聚乙烯薄膜以及沉积在氧化硅晶片上的十八烷基三氯硅烷（OTS）自组装单分子层进行表面改性。通过等离子体处理引入含氮基团后，进行了接触角测量和X射线光电子能谱分析。通过具有亚纳米精度的椭圆偏振光谱法单独测量了由于等离子体蚀刻导致的OTS单分子层的表面降解。我们的数据清楚地证明了存在一个最佳处理时间，该时间能产生高密度的NH2官能团，而不会使有机材料的结构特征发生显著变化。自组装单分子层是表征等离子体放电对聚烯烃影响的优秀模型系统。特别是，它们能够测试分子取向、堆积密度和结晶度对最终结果的影响。
