Dirican B, Oysul K, Beyzadeoglu M, Surenkok S, Pak Y
Department of Radiation Oncology, Gulhane Military Medical Academy, 06018 Etlik, Ankara, Turkey.
Neoplasma. 2004;51(5):390-4.
There has been a number of approaches in the literature for therapeutic malignant and benign orbital irradiation. All techniques intend to deliver a homogenous dose to the orbital and retroorbital target volume while sparing the lens of excessive dose. In this experimental lens-sparing study, 4 MeV and 12 MeV anterior electron irradiation has been used with cerrobend shielding circular blocks of varying diameter and thickness placed on a thin Mylar at the distal tip of the electron applicator to spare the lens. The first phase of the study in water phantom has been designed to determine the shield thickness and diameter constant for 4 MeV and 12 MeV electron beams. After optimizing the lens dose by water phantom, the second phase of our study has been designed to measure doses at lens and other specific localizations in randophantom under same conditions with 4 MeV and 12 MeV electron beams. By this technique lens accumulated 18.56% of prescribed dose and lateral aspects of the lens received 44.59% of the prescribed dose in 4 MeV electron irradiation, whereas this was 13.86% and 44.80%, respectively in 12 MeV electron irradiation. The technique used is found to be an extremely simple and effective technique allowing an easier setup with excellent dose distribution characteristics with lens sparing applicable to orbital irradiation practice.
文献中已出现多种用于治疗眼眶恶性和良性疾病的放射治疗方法。所有技术都旨在向眼眶及眶后靶区均匀输送剂量,同时避免晶状体接受过高剂量。在这项实验性晶状体保护研究中,使用了4兆电子伏和12兆电子伏的前部电子照射,并在电子施源器的远端薄聚酯薄膜上放置不同直径和厚度的铈钨屏蔽圆形挡块以保护晶状体。研究的第一阶段在水模体中进行,旨在确定4兆电子伏和12兆电子伏电子束的屏蔽厚度和直径常数。通过水模体优化晶状体剂量后,研究的第二阶段旨在在相同条件下,用4兆电子伏和12兆电子伏电子束测量随机模体中晶状体及其他特定部位的剂量。通过该技术,在4兆电子伏电子照射中,晶状体累积剂量为处方剂量的18.56%,晶状体侧面接受的剂量为处方剂量的44.59%,而在12兆电子伏电子照射中,这两个数值分别为13.86%和44.80%。所使用的技术被发现是一种极其简单有效的技术,它能更轻松地进行设置,具有出色的剂量分布特性,可用于眼眶照射实践中的晶状体保护。