Nae Florin Andrei, Saito Nagahiro, Hozumi Atsushi, Takai Osamu
EcoTopia Science Institute, Nagoya University, Chikusa, Nagoya 464-8603, Japan.
Langmuir. 2005 Feb 15;21(4):1398-402. doi: 10.1021/la0480944.
Using a molecular fluorine laser at 157 nm wavelength, submicron patterning of organosilane self-assembled monolayers (SAMs) is demonstrated utilizing mask-contact photolithography. An organosilane, namely, octadecyltrimethoxysilane [ODS, CH(3)(CH(2))(17)Si(OCH(3))(3)], SAM is chemisorbed onto Si substrates covered with a 2 nm thick oxide layer and subsequently patterned using the laser. The optical path of the laser beam and the photomask-sample space are evacuated and then backfilled and purged with nitrogen during laser firing. The resulting pattern is investigated using various measurement techniques. The scanning probe microscopy images show that patterns are transferred to the SAM-covered Si substrates and that 500 nm features are successfully photoprinted in this way.
利用波长为157nm的分子氟激光器，通过掩膜接触光刻技术实现了有机硅烷自组装单分子层（SAMs）的亚微米图案化。一种有机硅烷，即十八烷基三甲氧基硅烷[ODS，CH(3)(CH(2))(17)Si(OCH(3))(3)]，自组装单分子层化学吸附在覆盖有2nm厚氧化层的硅衬底上，随后用激光进行图案化。激光束的光路和光掩膜 - 样品空间先抽真空，然后在激光照射期间用氮气回填和吹扫。使用各种测量技术对所得图案进行研究。扫描探针显微镜图像表明图案被转移到了覆盖有自组装单分子层的硅衬底上，并且通过这种方式成功地光刻出了500nm的特征图案。
