Gautier Julien, Delmotte Franck, Roulliay Marc, Bridou Françoise, Ravet Marie-Françoise, Jérome Arnaud
Laboratoire Charles Fabry de l'Institut d'Optique, Centre National de la Recherche Scientifique, Unité Mixte de Recherche 8501, Bât. 503, Centre Scientifique d'Orsay, 91403 Orsay, France.
Appl Opt. 2005 Jan 20;44(3):384-90. doi: 10.1364/ao.44.000384.
We study theoretically and experimentally the increase of normal incidence reflectivity generated by addition of a third material in the period of a standard periodic multilayer, for wavelengths in the range 20 to 40 nm. The nature and thickness of the three materials has been optimized to provide the best enhancement of reflectivity. Theoretical reflectivity of an optimized B4C/Mo/Si multilayer reaches 42% at 32 nm. B4C/Mo/Si multilayers have been deposited with a magnetron sputtering system and a reflectivity of 34% at 32 nm has been measured on a synchrotron radiation source.
我们通过理论和实验研究了在标准周期多层膜的周期中添加第三种材料所产生的垂直入射反射率的增加情况,研究波长范围为20至40纳米。对这三种材料的性质和厚度进行了优化,以实现反射率的最佳增强。优化后的B4C/Mo/Si多层膜在32纳米波长处的理论反射率达到42%。利用磁控溅射系统制备了B4C/Mo/Si多层膜,并在同步辐射源上测得其在32纳米波长处的反射率为34%。