Andresa Juliana Salvador, Reis Rafael Machado, Gonzalez Eduardo Perez, Santos Leonardo Silva, Eberlin Marcos Nogueira, de Paula Nascente Pedro Augusto, Tanimoto Sonia Tomie, Machado Sérgio Antônio Spínola, Rodrigues-Filho Ubirajara P
Universidade de São Paulo, Instituto de Química de São Carlos, P.O. Box 780, 13564-970 São Carlos, Brazil.
J Colloid Interface Sci. 2005 Jun 1;286(1):303-9. doi: 10.1016/j.jcis.2005.01.019.
The present paper describes the one-pot procedure for the formation of self-assembled thin films of two silanes on the model oxidized silicon wafer, SiO2/Si. SiO2/Si is a model system for other surfaces, such as glass, quartz, aerosol, and silica gel. MALDI-TOF MS with and without a matrix, XPS, and AFM have confirmed the formation of self-assembled thin films of both 3-imidazolylpropyltrimethoxysilane (3-IPTS) and 4-(N-propyltriethoxysilane-imino)pyridine (4-PTSIP) on the SiO2/Si surface after 30 min. Longer adsorption times lead to the deposition of nonreacted 3-IPTS precursors and the formation of agglomerates on the 3-IPTS monolayer. The formation of 4-PTSIP self-assembled layers on SiO2/Si is also demonstrated. The present results for the flat SiO2/Si surface can lead to a better understanding of the formation of a stationary phase for affinity chromatography as well as transition-metal-supported catalysts on silica and their relationship with surface roughness and ordering. The 3-IPTS and 4-PTSIP modified SiO2/Si wafers can also be envisaged as possible built-on-silicon thin-layer chromatography (TLC) extraction devices for metal determination or N-heterocycle analytes, such as histidine and histamine, with "on-spot" MALDI-TOF MS detection.
本文描述了在模型氧化硅晶片SiO₂/Si上形成两种硅烷自组装薄膜的一锅法。SiO₂/Si是玻璃、石英、气溶胶和硅胶等其他表面的模型系统。带有和不带有基质的基质辅助激光解吸电离飞行时间质谱（MALDI-TOF MS）、X射线光电子能谱（XPS）和原子力显微镜（AFM）已证实，30分钟后在SiO₂/Si表面形成了3-咪唑基丙基三甲氧基硅烷（3-IPTS）和4-（N-丙基三乙氧基硅烷-亚氨基）吡啶（4-PTSIP）的自组装薄膜。更长的吸附时间会导致未反应的3-IPTS前体沉积，并在3-IPTS单层上形成团聚物。还证明了在SiO₂/Si上形成4-PTSIP自组装层。对于平坦的SiO₂/Si表面的当前结果可以更好地理解亲和色谱固定相以及二氧化硅上过渡金属负载催化剂的形成，以及它们与表面粗糙度和有序性的关系。3-IPTS和4-PTSIP修饰的SiO₂/Si晶片也可以设想为用于金属测定或N-杂环分析物（如组氨酸和组胺）的基于硅的薄层色谱（TLC）萃取装置，并具有“现场”MALDI-TOF MS检测功能。
