Takahashi Shinya, Sakamoto Ayako, Sato Shusei, Kato Tomohiko, Tabata Satoshi, Tanaka Atsushi
Department of Ion-beam-applied Biology, Japan Atomic Energy Research Institute, Watanuki 1233, Takasaki, Gunma, 370-1292, Japan.
Plant Physiol. 2005 Jun;138(2):870-81. doi: 10.1104/pp.105.060236. Epub 2005 May 20.
Plants have mechanisms for repairing and tolerating detrimental effects by various DNA damaging agents. A tolerance pathway that has been predicted to be present in higher plants is translesion synthesis (TLS), which is catalyzed by polymerases. In Arabidopsis (Arabidopsis thaliana), however, the only gene known to be involved in TLS is the Arabidopsis homolog of REV3, AtREV3, which is a putative catalytic subunit of Arabidopsis DNA polymerase zeta. A disrupted mutant of AtREV3, rev3, was previously found to be highly sensitive to ultraviolet-B (UV-B) and various DNA damaging agents. REV1 and REV7 are thought to be components of translesion synthesis in plants. In this study, we identified the Arabidopsis homologs of REV1 and REV7 (AtREV1 and AtREV7). Several mutants carrying disrupted AtREV1 and AtREV7 genes were isolated from Arabidopsis T-DNA-inserted lines. An AtREV1-disrupted mutant, rev1, was found to be moderately sensitive to UV-B and DNA cross-linkers. A rev1rev3 double mutant, like rev3, showed high sensitivity to UV-B, gamma-rays, and DNA cross-linkers. An AtREV7-disrupted mutant, rev7, was possibly sensitive to cis-diamminedichloroplatinum(II), a kind of DNA cross-linker, but it was not sensitive to acute UV-B and gamma-ray irradiation. On the other hand, the aerial growth of rev7, like the aerial growth of rev1 and rev3, was inhibited by long-term UV-B. These results suggest that a TLS mechanism exists in a higher plant and show that AtREV1 and AtREV7 have important roles in tolerating exposure to DNA-damaging agents.
植物具有修复和耐受各种DNA损伤剂有害影响的机制。一种预计存在于高等植物中的耐受途径是跨损伤合成(TLS),它由聚合酶催化。然而,在拟南芥(Arabidopsis thaliana)中,已知参与TLS的唯一基因是REV3的拟南芥同源物AtREV3,它是拟南芥DNA聚合酶ζ的推定催化亚基。先前发现AtREV3的破坏突变体rev3对紫外线B(UV-B)和各种DNA损伤剂高度敏感。REV1和REV7被认为是植物跨损伤合成的组成部分。在本研究中,我们鉴定了REV1和REV7的拟南芥同源物(AtREV1和AtREV7)。从拟南芥T-DNA插入系中分离出几个携带AtREV1和AtREV7基因破坏的突变体。发现AtREV1破坏突变体rev1对UV-B和DNA交联剂中度敏感。rev1rev3双突变体与rev3一样,对UV-B、γ射线和DNA交联剂表现出高敏感性。AtREV7破坏突变体rev7可能对一种DNA交联剂顺二氯二氨铂(II)敏感,但对急性UV-B和γ射线照射不敏感。另一方面,rev7的地上部分生长与rev1和rev3的地上部分生长一样,受到长期UV-B抑制。这些结果表明高等植物中存在TLS机制,并表明AtREV1和AtREV7在耐受DNA损伤剂暴露方面具有重要作用。