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利用高波长激光染料进行光敏化,从N-烷基吡啶鎓酯中光释放羧酸、氨基酸和磷酸盐。

Photorelease of carboxylic acids, amino acids, and phosphates from N-alkylpicolinium esters using photosensitization by high wavelength laser dyes.

作者信息

Sundararajan Chitra, Falvey Daniel E

机构信息

Department of Chemistry and Biochemistry, University of Maryland, College Park, Maryland 20742, USA.

出版信息

J Am Chem Soc. 2005 Jun 8;127(22):8000-1. doi: 10.1021/ja050760f.

Abstract

Visible light (>450 nm) is used to efficiently cleave carboxylic acids, amino acids, and phosphates from their N-methyl picolinium esters. Photolysis using pyrromethene dyes PM 546 and PM 597 and also coumarin 6 as photosensitizers effects release of carboxylic acids, N-protected amino acids, and phosphates in quantitative yields. The effective rate of photorelease by the dyes, Phiepsilon, was found to be as high as 4500 M-1 cm-1. The photorelease proceeds through photoinduced electron transfer from the dye sensitizers to the N-methyl picolinium group. Fluorescence quenching and laser flash photolysis experiments support the photoinduced electron-transfer mechanism.

摘要

可见光(>450纳米)用于有效地从其N-甲基吡啶鎓酯中裂解羧酸、氨基酸和磷酸盐。使用吡咯亚甲基染料PM 546和PM 597以及香豆素6作为光敏剂进行光解,可定量产率释放羧酸、N-保护氨基酸和磷酸盐。发现染料的光释放有效速率Phiepsilon高达4500 M-1 cm-1。光释放通过从染料敏化剂到N-甲基吡啶鎓基团的光诱导电子转移进行。荧光猝灭和激光闪光光解实验支持光诱导电子转移机制。

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