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与单独使用X射线相比,极低频磁场和X射线的联合照射增加了pTN89质粒中的突变率。

Combined exposure of ELF magnetic fields and x-rays increased mutant yields compared with x-rays alone in pTN89 plasmids.

作者信息

Koyama Shin, Nakahara Takehisa, Sakurai Tomonori, Komatsubara Yoshiki, Isozumi Yasuhito, Miyakoshi Junji

机构信息

Department of Radiological Technology, School of Health Sciences, Faculty of Medicine, Hirosaki University, Japan.

出版信息

J Radiat Res. 2005 Jun;46(2):257-64. doi: 10.1269/jrr.46.257.

Abstract

We have examined mutations in the supF gene carried by pTN89 plasmids in Escherichia coli (E. coli) to examine the effects of extremely low frequency magnetic fields (ELFMFs) and/or X-rays to the plasmids. The plasmids were subjected to sham exposure or exposed to an ELFMF (5 mT), with or without X-ray irradiation (10 Gy). For the combined treatments, exposure to the ELFMF was immediately before or after X-ray irradiation. The mutant fractions were 0.94x10(-5 )for X-rays alone, 1.58x10(-5) for an ELFMF followed by X-rays, and 3.64x10(-5) for X-rays followed by an ELFMF. Increased mutant fraction was not detected following exposure to a magnetic field alone, or after sham exposure. The mutant fraction for X-rays followed by an ELFMF was significantly higher than those of other treatments. Sequence analysis of the supF mutant plasmids revealed that base substitutions were dominant on exposure to X-rays alone and X-rays plus an ELFMF. Several types of deletions were detected in only the combined treatments, but not with X-rays alone. We could not find any mutant colonies in sham irradiated and an ELFMF alone treatment, but exposure to ELFMFs immediately before or after X-ray irradiation may enhance the mutations. Our results indicate that an ELFMF increases mutation and alters the spectrum of mutations.

摘要

我们检测了大肠杆菌(E. coli)中携带于pTN89质粒上的supF基因的突变情况,以研究极低频磁场(ELFMFs)和/或X射线对质粒的影响。质粒分别接受假照射或暴露于ELFMF(5 mT),同时伴有或不伴有X射线照射(10 Gy)。对于联合处理,ELFMF暴露在X射线照射之前或之后立即进行。单独X射线照射的突变率为0.94×10⁻⁵,ELFMF后接X射线照射的突变率为1.58×10⁻⁵,X射线后接ELFMF照射的突变率为3.64×10⁻⁵。单独暴露于磁场或假照射后未检测到突变率增加。X射线后接ELFMF照射的突变率显著高于其他处理组。对supF突变体质粒的序列分析表明,单独X射线照射以及X射线加ELFMF照射时碱基替换占主导。仅在联合处理中检测到几种类型的缺失,而单独X射线照射时未检测到。在假照射和单独ELFMF处理中未发现任何突变菌落,但在X射线照射之前或之后立即暴露于ELFMF可能会增加突变。我们的结果表明,ELFMF会增加突变并改变突变谱。

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