Hnatovsky C, Taylor R S, Simova E, Bhardwaj V R, Rayner D M, Corkum P B
National Research Council of Canada, 1200 Montreal Road, Ottawa, Ontario K1A 0R6, Canada.
Opt Lett. 2005 Jul 15;30(14):1867-9. doi: 10.1364/ol.30.001867.
We fabricate microchannels in fused silica by femtosecond laser irradiation followed by etching in diluted hydrofluoric acid. We show a dramatic dependence of the etch rate on the laser polarization, spanning 2 orders of magnitude. We establish the existence of an energy-per-pulse threshold at which etching of the laser-modified zones becomes highly polarization selective. The enhanced selective etching is due to long-range, periodic, polarization-dependent nanostructures formed in the laser-modified material.
我们通过飞秒激光辐照在熔融石英中制造微通道，然后在稀释的氢氟酸中进行蚀刻。我们发现蚀刻速率对激光偏振具有显著依赖性，跨度达2个数量级。我们确定了每个脉冲能量阈值的存在，在该阈值下激光改性区域的蚀刻变得高度偏振选择性。增强的选择性蚀刻归因于在激光改性材料中形成的长程、周期性、偏振依赖的纳米结构。
