Department of Microbiology, Washington State University, Pullman, Washington 99164-4340.
Appl Environ Microbiol. 1990 Mar;56(3):815-8. doi: 10.1128/aem.56.3.815-818.1990.
Bacterial isolates of the genus Xenorhabdus were shown to be extremely sensitive to photoproducts produced in a number of common media irradiated by fluorescent light. Two forms of toxic oxygen, hydrogen peroxide and superoxide radical, were produced in the media upon exposure to fluorescent light. The addition of pyruvate or catalase to the irradiated media eliminated the toxicity. The poor plating efficiencies previously reported for Xenorhabdus spp. are likely due to the uncontrolled exposure of media to ambient lighting.
黄杆菌属的细菌分离物对荧光照射下的几种常见培养基产生的光产物极其敏感。荧光照射后,培养基中会产生两种形式的有毒氧,即过氧化氢和超氧自由基。向辐照后的培养基中添加丙酮酸或过氧化氢酶可消除毒性。先前报道的 Xenorhabdus spp. 的较差平板效率可能是由于培养基不受控制地暴露在环境光照下。