Tal O, Rosenwaks Y, Preezant Y, Tessler N, Chan C K, Kahn A
Department of Physical Electronics, Tel Aviv University, Tel Aviv 69978, Israel.
Phys Rev Lett. 2005 Dec 16;95(25):256405. doi: 10.1103/PhysRevLett.95.256405.
We investigate the density of states (DOS) for hole transport in undoped and doped amorphous organic films using high lateral resolution Kelvin probe force microscopy. Measurements are done on field effect transistors made of N,N1-diphenyl-N, N1-bis(1-naphthyl)-1,10-biphenyl-4,4II-diamine undoped or p doped with tetrafluoro-tetracyanoquinodimethane. We determine the DOS structure of the undoped material, including an anomalous peak related to interfaces between regions of different surface potential, the DOS doping-induced broadening, and doping-induced sharp peaks on the main DOS distribution.
我们使用高横向分辨率开尔文探针力显微镜研究了未掺杂和掺杂非晶有机薄膜中空穴传输的态密度(DOS)。测量是在由未掺杂或用四氟四氰基喹二甲基甲烷进行p型掺杂的N,N1 - 二苯基 - N,N1 - 双(1 - 萘基)-1,10 - 联苯 - 4,4II - 二胺制成的场效应晶体管上进行的。我们确定了未掺杂材料的DOS结构,包括与不同表面势区域之间的界面相关的异常峰、DOS掺杂引起的展宽以及在主要DOS分布上的掺杂引起的尖锐峰。