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基于选择性化学蚀刻的纳米尺寸光纤电极的制备及其用于扫描电化学/光学显微镜的表征

Fabrication and characterization of a nanometer-sized optical fiber electrode based on selective chemical etching for scanning electrochemical/optical microscopy.

作者信息

Maruyama Kenichi, Ohkawa Hiroyuki, Ogawa Sho, Ueda Akio, Niwa Osamu, Suzuki Koji

机构信息

Department of Applied Chemistry, Faculty of Science and Technology, Keio University, 3-14-1 Hiyoshi, Kohoku-ku, Yokohama, Kanagawa 223-8522, Japan.

出版信息

Anal Chem. 2006 Mar 15;78(6):1904-12. doi: 10.1021/ac0502549.

Abstract

We have already reported a method for fabricating ultramicroelectrodes (Suzuki, K. JP Patent, 2004-45394, 2004). This method is based on the selective chemical etching of optical fibers. In this work, we undertake a detailed investigation involving a combination of etched optical fibers with various types of tapered tip (protruding-shape, double- (or pencil-) shape and triple-tapered electrode) and insulation with electrophoretic paint. Our goal is to establish a method for fabricating nanometer-sized optical fiber electrodes with high reproducibility. As a result, we realized pencil-shaped and triple-tapered electrodes that had radii in the nanometer range with high reproducibility. These nanometer-sized electrodes showed well-defined sigmoidal curves and stable diffusion-limited responses with cyclic voltammetry. The pencil-shaped optical fiber, which has a conical tip with a cone angle of 20 degrees , was effective for controlling the electrode radius. The pencil-shaped electrodes had higher reproducibility and smaller electrode radii (r(app) < 1.0 nm) than those of other etched optical fiber electrodes. By using a pencil-shaped electrode with a 105-nm radius as a probe, we obtained simultaneous electrochemical and optical images of an implantable interdigitated array electrode. We achieved nanometer-scale resolution with a combination of scanning electrochemical microscopy SECM and optical microscopy. The resolution of the electrochemical and optical images indicated sizes of 300 and 930 nm, respectively. The neurites of living PC12 cells were also successfully imaged on a 1.6-microm scale by using the negative feedback mode of an SECM.

摘要

我们已经报道了一种制造超微电极的方法(铃木,K. 日本专利,2004 - 45394,2004)。该方法基于对光纤的选择性化学蚀刻。在这项工作中,我们进行了详细的研究,将蚀刻后的光纤与各种类型的锥形尖端(突出形状、双(或铅笔)形状和三锥形电极)相结合,并用电泳漆进行绝缘处理。我们的目标是建立一种具有高重现性的制造纳米级光纤电极的方法。结果,我们实现了半径在纳米范围内且具有高重现性的铅笔形状和三锥形电极。这些纳米级电极在循环伏安法中显示出明确的S形曲线和稳定的扩散限制响应。锥角为20度的锥形尖端的铅笔形状光纤对于控制电极半径是有效的。与其他蚀刻光纤电极相比,铅笔形状电极具有更高的重现性和更小的电极半径(r(app) < 1.0 nm)。通过使用半径为105 nm的铅笔形状电极作为探针,我们获得了可植入叉指阵列电极的同步电化学和光学图像。我们通过扫描电化学显微镜(SECM)和光学显微镜的组合实现了纳米级分辨率。电化学和光学图像的分辨率分别表明尺寸为300和930 nm。使用SECM的负反馈模式,还成功地在1.6微米尺度上对活PC12细胞的神经突进行了成像。

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