Murata Tsuyoshi, Ishizawa Hitoshi, Motoyama Izumi, Tanaka Akira
Department of Lens Engineering Development, Production Technology Headquarters, Core Technology Center, Nikon Corporation, 10-1, Asamizodai 1-chome, Sagamihara, Kanagawa 228-0828, Japan.
Appl Opt. 2006 Mar 1;45(7):1465-8. doi: 10.1364/ao.45.001465.
An ultralow refractive index is very advantageous when one designs antireflective coatings. We successfully obtained high-quality MgF2 thin films with ultralow refractive indices from autoclaved sols prepared from magnesium acetate and hydrofluoric acid. The MgF2 films consist of nanosized particles, and they have high laser-exposure durability at 193 nm. The reflectance of the antireflective coating with five layers, of which the top layer is formed by our method, is lower than 0.6% in the incident angle range of 0 degrees - 60 degrees at 193 nm.
在设计抗反射涂层时，超低折射率非常有利。我们通过由醋酸镁和氢氟酸制备的高压釜溶胶成功获得了具有超低折射率的高质量MgF₂薄膜。MgF₂薄膜由纳米尺寸的颗粒组成，并且在193nm处具有高激光曝光耐久性。在193nm处，顶层采用我们的方法形成的五层抗反射涂层在0度至60度的入射角范围内的反射率低于0.6%。
