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利用高压釜溶胶制备超低折射率MgF₂光学薄膜的研究

Investigation of MgF2 optical thin films with ultralow refractive indices prepared from autoclaved sols.

作者信息

Murata Tsuyoshi, Ishizawa Hitoshi, Tanaka Akira

机构信息

Core Technology Center, Nikon Corporation, 10-1 Asamizodai 1-chome, Sagamihara, Kanagawa 228-0828, Japan.

出版信息

Appl Opt. 2008 May 1;47(13):C246-50. doi: 10.1364/ao.47.00c246.

DOI:10.1364/ao.47.00c246
PMID:18449252
Abstract

We have successfully developed a process to form high quality MgF(2) thin films with ultralow refractive indices from autoclaved sols prepared from magnesium acetate and hydrofluoric acid. And we have confirmed that our porous MgF(2) coatings have not only high transmittance in the UV region but also high uniformity of film thickness. They can be uniformly formed on phiv 300 mm substrates as a single coating and as a hybrid coating with sublayers formed by physical vapor deposition. They are expected to be applied to various optics that need high transmittance in the UV region.

摘要

我们已经成功开发出一种工艺,可从由醋酸镁和氢氟酸制备的高压灭菌溶胶中形成具有超低折射率的高质量MgF₂薄膜。并且我们已经证实,我们的多孔MgF₂涂层不仅在紫外区域具有高透射率,而且膜厚均匀性高。它们可以作为单层涂层以及与通过物理气相沉积形成的子层的混合涂层均匀地形成在直径300mm的基板上。预计它们将应用于需要在紫外区域具有高透射率的各种光学器件。

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