Ishizawa Hitoshi, Niisaka Shunsuke, Murata Tsuyoshi, Tanaka Akira
Materials and Advanced Research Laboratory, Nikon Corporation, 1-10-1 Asamizodai, Sagamihara, Kanagawa 228-0828, Japan.
Appl Opt. 2008 May 1;47(13):C200-5. doi: 10.1364/ao.47.00c200.
Porous MgF(2)-SiO(2) thin films consisting of MgF(2) particles connected by an amorphous SiO(2) binder are prepared by a solgel process. The films have a low refractive index of 1.26, sufficient strength to withstand wiping by a cloth, and a high environmental resistance. The refractive index of the film can be controlled by changing the processing conditions. Films can be uniformly formed on curved substrates and at relatively low temperatures, such as 100 degrees C. The low refractive index of the film, which cannot be achieved by conventional dry processes, is effective in improving the performance of antireflective coatings.
通过溶胶 - 凝胶工艺制备了由非晶态SiO₂粘合剂连接的MgF₂颗粒组成的多孔MgF₂ - SiO₂薄膜。这些薄膜具有1.26的低折射率、足以承受用布擦拭的强度以及高耐环境性。薄膜的折射率可以通过改变加工条件来控制。薄膜可以在弯曲的基板上且在相对较低的温度（如100℃）下均匀形成。该薄膜的低折射率是传统干法工艺无法实现的，这对于提高抗反射涂层的性能是有效的。
