Xi J Q, Kim Jong Kyu, Schubert E E, Ye Dexian, Lu T M, Lin Shawn-Yu, Juneja Jasbir S
Department of Electrical, Computer, and Systems Engineering, Rensselaer Polytechnic Institute, Troy, NY 12180, USA.
Opt Lett. 2006 Mar 1;31(5):601-3. doi: 10.1364/ol.31.000601.
The refractive-index contrast in dielectric multilayer structures, optical resonators, and photonic crystals is an important figure of merit that creates a strong demand for high-quality thin films with a low refractive index. A SiO2 nanorod layer with low refractive index of n = 1.08, to our knowledge the lowest ever reported in thin-film materials, is grown by oblique-angle electron-beam deposition of SiO2. A single-pair distributed Bragg reflector employing a SiO2 nanorod layer is demonstrated to have enhanced reflectivity, showing the great potential of low-refractive-index films for applications in photonic structures and devices.
介电多层结构、光学谐振器和光子晶体中的折射率对比度是一个重要的品质因数，这对具有低折射率的高质量薄膜产生了强烈需求。据我们所知，通过SiO₂的斜角电子束沉积生长出了折射率低至n = 1.08的SiO₂纳米棒层，这是薄膜材料中报道过的最低折射率。采用SiO₂纳米棒层的单对分布式布拉格反射器被证明具有增强的反射率，显示出低折射率薄膜在光子结构和器件应用中的巨大潜力。
