Jia Bojie, Chen Gang, Zhou Sheng, Ma Xiaofeng, Zhang Qiuyu, Geng Yujia, Xu Teng, Liu Dingquan
Shanghai Key Laboratory of Optical Coatings and Spectral Modulation, Shanghai Institute of Technical Physics, Chinese Academy of Sciences, Shanghai 200083, China.
University of Chinese Academy of Sciences, Beijing 100049, China.
Materials (Basel). 2025 May 12;18(10):2225. doi: 10.3390/ma18102225.
The refractive index is one of the most important optical parameters of optical thin films. Optical films with a low refractive index can effectively reduce the residual reflection on the film surface, which is one of the most important parameters pursued by scholars. In this research, SiO thin films with a low refractive index and nanocolumnar structures were prepared by oblique angle deposition (OAD). The SiO thin films deposited at different inclination angles were prepared using the electron beam evaporative deposition method. The single-layer film samples were measured by ellipsometry, infrared spectrometry, scanning electron microscopy (SEM), and atomic force microscopy (AFM). The experimental results demonstrated that at an inclination angle of 85°, the average refractive index of the film decreased to 1.30 in the 350-1300 nm wavelength range. Additionally, the film deposited on one side of a crystalline AlO substrate achieved a transmittance of 92.1% in the 350-1500 nm wavelength range and the residual reflectance was reduced by 0.7%.
折射率是光学薄膜最重要的光学参数之一。低折射率光学薄膜能够有效降低薄膜表面的残余反射，这是学者们所追求的最重要参数之一。在本研究中，通过倾斜角沉积（OAD）制备了具有低折射率和纳米柱状结构的SiO薄膜。采用电子束蒸发沉积法制备了不同倾斜角下沉积的SiO薄膜。通过椭圆偏振光谱法、红外光谱法、扫描电子显微镜（SEM）和原子力显微镜（AFM）对单层薄膜样品进行了测量。实验结果表明，在倾斜角为85°时，薄膜在350 - 1300 nm波长范围内的平均折射率降至1.30。此外，沉积在晶体AlO衬底一侧的薄膜在350 - 1500 nm波长范围内的透过率达到92.1%，残余反射率降低了0.7%。
