Wang Shunquan, Zhou Changhe, Zhang Yanyan, Ru Huayi
Shanghai Institute of Optics and Fine Mechanics, Academia Sinica, China.
Appl Opt. 2006 Apr 20;45(12):2567-71. doi: 10.1364/ao.45.002567.
We describe the design, fabrication, and excellent performance of an optimized deep-etched high-density fused-silica transmission grating for use in dense wavelength division multiplexing (DWDM) systems. The fabricated optimized transmission grating exhibits an efficiency of 87.1% at a wavelength of 1550 nm. Inductively coupled plasma-etching technology was used to fabricate the grating. The deep-etched high-density fused-silica transmission grating is suitable for use in a DWDM system because of its high efficiency, low polarization-dependent loss, parallel demultiplexing, and stable optical performance. The fabricated deep-etched high-density fused-silica transmission gratings should play an important role in DWDM systems.
