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在红荧烯薄膜生长过程中实时观察到的反常粗糙度演变。

Anomalous roughness evolution of rubrene thin films observed in real time during growth.

作者信息

Kowarik S, Gerlach A, Sellner S, Schreiber F, Pflaum J, Cavalcanti L, Konovalov O

机构信息

Physical and Theoretical Chemistry, Oxford University, South Parks Road, Oxford OX1 3QZ, UK.

出版信息

Phys Chem Chem Phys. 2006 Apr 21;8(15):1834-6. doi: 10.1039/b517866e. Epub 2006 Feb 23.

DOI:10.1039/b517866e
PMID:16633669
Abstract

We study the growth and structure of thin films of the organic semiconductor rubrene during organic molecular beam deposition (OMBD) on silicon oxide in situ and in real time using X-ray scattering. Using in situ grazing incidence diffraction (GID) we find a small degree of local order but an otherwise largely disordered structure, consistent with out of plane scans. Monitoring the surface morphology in real time during growth, we find relatively smooth films (surface roughness sigma below approximately 15 A for thicknesses up to at least 600 A) and a significant delay before the onset of roughening. This anomalous roughening in the beginning and crossover to normal roughening later during growth may be related to conformational changes of rubrene in the early stages of growth.

摘要

我们利用X射线散射原位实时研究了有机半导体红荧烯薄膜在氧化硅上进行有机分子束沉积(OMBD)过程中的生长和结构。通过原位掠入射衍射(GID),我们发现存在一定程度的局部有序,但在其他方面结构大多无序,这与面外扫描结果一致。在生长过程中实时监测表面形貌,我们发现薄膜相对光滑(对于厚度至少达600埃的薄膜,表面粗糙度σ低于约15埃),并且在开始出现粗糙度之前有明显延迟。生长初期这种异常的粗糙度以及随后生长过程中向正常粗糙度的转变可能与生长早期红荧烯的构象变化有关。

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